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  • 2000-2004  (3)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Czechoslovak journal of physics 50 (2000), S. 655-663 
    ISSN: 1572-9486
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The paper reports on properties and structure of the TiN films, which have been deposited on titanium interlayer covering a steel substrate. The Ti interlayer and the TiN film were prepared by d.c. magnetron sputtering in Ar and Ar + N2 mixture, respectively. Three Ti interlayers with different thickness h Ti = 0.01, 0.1 and 0.2 μm were prepared under the same conditions and investigated. It was found that the macroscopic residual stress in the TiN films is compressive and increases with the increasing negative bias up to approximately −150V. Also the size of the TiN crystallites decreases with the increasing negative substrate bias, varying between 250 nm and 11 nm. The critical load, which characterises the film adhesion, increases with increasing h Ti For h Ti ≥ 0.1 μm, the critical load almost does not depend on the bias voltage.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Czechoslovak journal of physics 50 (2000), S. 785-794 
    ISSN: 1572-9486
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract This paper describes a d.c. diode sputtering system in which the sputtering discharge is sustained by an r.f. or microwave plasma excited with a helix coil surrounded by eight SmCo magnets. The discharge is characterized in terms of the discharge d.c. current through the cathode. The microwave and r.f. excitation and two different configurations of the magnets are compared. The production of r.f. or microwave discharge in a magnetic field makes it possible to operate this system even at low pressures down to 0.01 Pa.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The Ni22Cr10Al1Y alloy was exposed in H2/H2S gas mixture under the sulphur pressure 10−3 and 1 Pa as well as in SO2 at 1173 and 1273 K. At ps = 1 Pa the sulphidation rate was relatively high and the reaction obeyed the linear rate law. Under these conditions a nickel/nickel sulphide eutectic was formed. At ps = 10−3 Pa nickel sulphides became unstable and the sulphidation rate was significantly lower. The reaction obeyed the parabolic rate law. The oxidation rate of the alloy in SO2 was lower than that in any of the H2/H2S atmospheres. The sulphide scales formed during sulphidation in H2/H2S had complex microstructures and compositions, with sulphospinel and sulphide phases being present, e.g. NiCr2S4, Ni3S2, CrxSy. As the temperature increased and the sulphur pressure decreased, these phases were replaced by the chromium-rich sulphide phase. Various oxides formed during oxidation of the alloy in SO2.
    Type of Medium: Electronic Resource
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