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  • 06.90.+v  (1)
  • Surface conductivity  (1)
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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 11 (1989), S. 583-613 
    ISSN: 0392-6737
    Keywords: Surface conductivity
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto La diminuzione della luminescenza (vicino al band gap) nel GaAs durante illuminazione continua a bassa intensità e a temperatura ambiente è quantitativamente spiegata da un modello in cui le reazioni tra i difetti reticolari in prossimità della superficie sono promosse dall’intrappolamento e dalla ricombinazione delle cariche elettriche in centri di ricombinazione senza emissione luminosa. Il modello che proponiamo spiega accuratamente le osservazioni sperimentali: la velocità di diminuzione della luminescenza stessa, la sua dipendenza dall’intensità dell’illuminazione esterna e dalla temperatura e la mancata diminuzione della luminescenza quando il GaAs è impiantato a bassa profondità.
    Abstract: Резюме Количественно описывается деградация фото-люминесцентного излучения вблизи запрещенной зоны в GaAs со временем экспозиции c.w.-лазерным возбуждением малой мощности при комнатной температуре с помощью модели, которая основана на реакции дефектов, которые стимулируют захват и рекомбинацию носителей в нерадиационных узлах рекомбинации. Предложенная модель описывает наблюдаемую интенсивность деградации, зависимость деградации от мощности и температуры, а также отсутствие деградации на поверхности в случае неглубокой имплантации ионов.
    Notes: Summary Degradation of near band gap photo-luminescence emission in GaAs with time of exposure to low power, c.w. laser excitation at room temperature is quantitatively described by a model based on defect reactions that are promoted by trapping and recombination of excess carriers at nonradiative recombination sites. The proposed model accurately describes the observed degradation rate, its power and temperature dependence, as well as the absence of degradation at a surface with shallow ion implantation.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1432-0630
    Keywords: 0.7.60.Ly ; 06.90.+v ; 42.79.−e ; 89.20.+a
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract We have adapted differential interference contrast Nomarski microscopy in the transmission configuration to the problem of mapping subsurface defects in semiconductors. We have demonstrated the ability to rapidly measure the depth of the precipitate-free-zone in silicon with a reproducibility of ±1 μm in whole Si wafers up to 200 nm in diameter, having an extrinsic doping concentration up to 7×1019 cm−3 and a nominal, as received, back side roughness. Because our subsurface defect profiler is completely non-destructive, product wafers can be inspected at various stages of processing and immediately returned to the production line.
    Type of Medium: Electronic Resource
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