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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 54 (1992), S. 570-573 
    ISSN: 1432-0630
    Keywords: 06.70Dn ; 42.80−f ; 89.20+a
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract An instrument is described that can be used to monitor, with unprecedented sensitivity, changes in the optical reflectivity due to crystailine damage incurred during ion implantation. It is shown that at the shot-noise limit, changes in the optical reflectivity of silicon as small as 5·10−7 can be measured in a 10 Hz bandwidth with a signal-to-noise ratio of 100, corresponding to an extrapolated uniform implantation dose of 5·108 cm−2 for 11B+ at 50 keV in silicon.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 11 (1989), S. 583-613 
    ISSN: 0392-6737
    Keywords: Surface conductivity
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto La diminuzione della luminescenza (vicino al band gap) nel GaAs durante illuminazione continua a bassa intensità e a temperatura ambiente è quantitativamente spiegata da un modello in cui le reazioni tra i difetti reticolari in prossimità della superficie sono promosse dall’intrappolamento e dalla ricombinazione delle cariche elettriche in centri di ricombinazione senza emissione luminosa. Il modello che proponiamo spiega accuratamente le osservazioni sperimentali: la velocità di diminuzione della luminescenza stessa, la sua dipendenza dall’intensità dell’illuminazione esterna e dalla temperatura e la mancata diminuzione della luminescenza quando il GaAs è impiantato a bassa profondità.
    Abstract: Резюме Количественно описывается деградация фото-люминесцентного излучения вблизи запрещенной зоны в GaAs со временем экспозиции c.w.-лазерным возбуждением малой мощности при комнатной температуре с помощью модели, которая основана на реакции дефектов, которые стимулируют захват и рекомбинацию носителей в нерадиационных узлах рекомбинации. Предложенная модель описывает наблюдаемую интенсивность деградации, зависимость деградации от мощности и температуры, а также отсутствие деградации на поверхности в случае неглубокой имплантации ионов.
    Notes: Summary Degradation of near band gap photo-luminescence emission in GaAs with time of exposure to low power, c.w. laser excitation at room temperature is quantitatively described by a model based on defect reactions that are promoted by trapping and recombination of excess carriers at nonradiative recombination sites. The proposed model accurately describes the observed degradation rate, its power and temperature dependence, as well as the absence of degradation at a surface with shallow ion implantation.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 8 (1986), S. 385-416 
    ISSN: 0392-6737
    Keywords: Mechanical and elastic waves
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto Generazione della seconda armonica ottica è ottenuta nei monocristalli di Si e Ge con impulsi laser di 10 ps, a 527 nm, e con densità di energia inpingente superiore all soglia per la fuzione del reticolo cristallino. Si osserva che la seconda armonica mantiene la propria dipendenza dall' orientazione cristallografica, indipendente dal valore della densità di energia che è incidente sulla superficie cristallina, fino alla soglia del danno. Il mutamento d'intensità di generazione a secondo orientazione cristallografica e piano di polarizzazione è stato analizzato in funzione di vari contributi probabili.
    Notes: Summary The crystallographic dependence of optical-second-harmonic generation (SHG) in Si and Ge single crystals is obtained with 10 ps pulses at 527 nm and at incident fluences above the threshold for laser melting of the crystal lattice. We find that the experimentally observed dependence of SHG on crystal orientation remains unchanged up to the damage limit. Observed selection rules are analysed in terms of various possible contributions.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physica B+C 117-118 (1983), S. 549-551 
    ISSN: 0378-4363
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Chemical Physics Letters 46 (1977), S. 245-248 
    ISSN: 0009-2614
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 2542-2553 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have modeled the generation, diffusion, and recombination of photoexcited electrons and holes for the case of Czochralski Si wafers having a defect-free-zone (DFZ) device layer of thickness d above a highly precipitated wafer core and having a finite surface recombination velocity, S. The incident photoexcitation source has a Gaussian power distribution and is focused to a small spot on the sample surface. When the source is sinusoidally modulated at frequency ν, the intrinsic band-edge photoluminescence (PL) emission displays modulations at the fundamental and first overtone of the modulation frequency. The PL signals at frequencies ν and 2ν are delayed in phase, with respect to the source modulation by angles φ2(ν) and φ2(2ν). We relate these phase angles to material properties such as d, S, the optical absorption coefficient α at the incident wavelength, and to the effective carrier lifetimes τ1 and τ2 in the DFZ and precipitated wafer core, respectively. We show that when τ1 and τ2 are independently measured and S(approximately-less-than)100 cm/s, as is common for a Si surface passivated with a thermally grown oxide layer, it is possible to deduce d from a measurement of φ2(ν) or φ2(2ν).
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Solid State Communications 15 (1974), S. 113-117 
    ISSN: 0038-1098
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Solid State Communications 46 (1983), S. 337-340 
    ISSN: 0038-1098
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1432-0630
    Keywords: 0.7.60.Ly ; 06.90.+v ; 42.79.−e ; 89.20.+a
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract We have adapted differential interference contrast Nomarski microscopy in the transmission configuration to the problem of mapping subsurface defects in semiconductors. We have demonstrated the ability to rapidly measure the depth of the precipitate-free-zone in silicon with a reproducibility of ±1 μm in whole Si wafers up to 200 nm in diameter, having an extrinsic doping concentration up to 7×1019 cm−3 and a nominal, as received, back side roughness. Because our subsurface defect profiler is completely non-destructive, product wafers can be inspected at various stages of processing and immediately returned to the production line.
    Type of Medium: Electronic Resource
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