ZIB

Hits per page

hit 1 - 1 | 1 hit

Select All Export

Electronic Resource

An optical bridge reflectometer for sensitive measurement of ion implantation dose (1992)

Guidotti, D. ; Wilman, J. G. ; Ricci, A. J.

Springer

Applied physics 54 (1992), S. 570-573

add to mindlist on the mindlist

Details

ISSN: 1432-0630

Keywords: 06.70Dn ; 42.80−f ; 89.20+a

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: Abstract An instrument is described that can be used to monitor, with unprecedented sensitivity, changes in the optical reflectivity due to crystailine damage incurred during ion implantation. It is shown that at the shot-noise limit, changes in the optical reflectivity of silicon as small as 5·10−7 can be measured in a 10 Hz bandwidth with a signal-to-noise ratio of 100, corresponding to an extrapolated uniform implantation dose of 5·108 cm−2 for 11B+ at 50 keV in silicon.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF00324342

Library	Location	Call Number	Volume/Issue/Year	Availability

Others were also interested in ...

Paper (German National Licenses)

Fulltext

hit 1 - 1 | 1 hit