Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
80 (1996), S. 3639-3645
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have examined sputtered metal/Al2O3 multilayers (metal: Co, Pt, W) with respect to their suitability as x-ray mirrors in high temperature environments. The rf-sputtering technique leads to layered structures with interface roughnesses of only 0.2 nm as confirmed by x-ray scattering and transmission electron microscopy. In situ resistance measurements characterize the percolation process and indicate the lower thickness limits for the chosen materials which lead to minimum modulation periods of ≈2 nm. The samples were characterized after stepwise annealing up to 1000 °C. Reflectivity values of nearly 100% at the first satellite-reflection were found in the case of Pt and W (for λ=0.15418 nm). The most stable W/Al2O3 multilayer reflects 70% of the primary beam even after annealing at 900 °C. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.363310
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