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  • 11
    ISSN: 0042-207X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Type of Medium: Electronic Resource
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  • 12
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Nuclear Inst. and Methods in Physics Research, B 33 (1988), S. 587-590 
    ISSN: 0168-583X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 13
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Nuclear Instruments and Methods 131 (1975), S. 457-462 
    ISSN: 0029-554X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Energy, Environment Protection, Nuclear Power Engineering , Physics
    Type of Medium: Electronic Resource
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  • 14
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 11 (1989), S. 355-365 
    ISSN: 0392-6737
    Keywords: Surface double layers ; Schottky barriers ; work functions
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto In questo lavoro vengono presentati risultati concernenti barriere Schottky Mo/GaAs preparate mediante «sputtering» in continua, per diversi valori delle tensioni di «sputtering». Le misure di caratteristiche corrente-tensione e capacità-tensione mostrano che è possibile ottenere barriere con buone caratteristiche elettriche (fattore di idealità prossimo ad uno, corrente di saturazione inversa molto bassa), purché siano scelte le giuste condizioni di deposizione. È stato anche condotto uno studio dettagliato delle ricavare informazioni sul meccanismo di trasporto dei portatori di carica. I risultati sperimentali mostrano che il comportamento di questo tipo di barriere è perfettamente spiegabile nell'ambito del modello unificato dei difetti nelle barriere Schottky nel GaAs.
    Abstract: Резюме Барьеры Шоттки Mo/GaAs приготовлены с помощью распыления при различных значениях напряЗения распыления. Измерения зависимостей тока от напряЗения и емкости от напряЗения показывают, что зти барьеры могут иметь очень хорощие свойства, если выбираются соответствующие условия приготовления. Подробное исследование вольт-амперных характеристик в зависимости от температуры позволяет проанализировать механизмы переноса заряда и связать их с усломиями приготовления. Зкспериментальые результаты показывают, что поведение барьеров Шоттки Mo/GaAs, приготовленных с помощьюDC распыления, моЗно успешно объяснить на основе единой модели дефектов, предлоЗенной для барьеров Шоттки GaAs.
    Notes: Summary Mo/GaAs Schottky barriers have been prepared by d.c. sputtering, for different values of the sputtering voltage. Current-voltage and capacitance-voltage measurements show that these barriers can have very good properties (near one ideality factor, very low inverse saturation current) if suitable preparation conditions are chosen. A detailed study of the current-voltage characteristics as a function of the temperature allows us to analyse the carrier transport mechanisms and to correlate them to the preparation conditions. The experimental results show that the behaviour of the Mo/GaAs Schottky barriers, prepared by d.c. sputtering, can be successfully explained on the basis of the unified defect model proposed for the GaAs schottky barriers.
    Type of Medium: Electronic Resource
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