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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6247-6250 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An inverse parabolic quantum well was successfully grown by molecular-beam epitaxy using a digital compositional grading superlattice composed of Al0.36Ga0.64As/GaAs. The photoluminescence and photocurrent measurements for this structure gave a good agreement between experimental and theoretical results. Large Stark shift and amplitude reduction of 1e-1hh exciton resonance under applied electric field were found in the photoluminescence spectra, which are substantially larger than the conventional square quantum well. These properties benefited from the concept of local-to-global state transitions.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4484-4488 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A self-consistent theoretical analysis, using both the Schrödinger and Poisson equations, is made to calculate the electric field-dependent intersubband electron transition for a thin layer inserted in a quantum well. In a 100-A(ring)-wide square quantum well a layer is embedded giving a deeper wall (or a barrier). This layer is carefully adjusted in its position and composition to optimize the dependence of intersubband transition on the external electric field. The analysis shows that the structure with a narrow well thickness between 30 and 45 A(ring), located at the side of the wide well, has optimal properties in terms of large near-linear Stark shifts associated with high oscillator strengths and a wide range of voltage tunability in the transition wavelength.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 2224-2230 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The microstructure of strained layers of InxGa1−xAs/GaAs grown by molecular-beam epitaxy has been investigated by transmission electron microscopy. lt was found that the formation of irregular interfacial morphologies of the InxGa1−xAs layers was due to a transition in growth mode from two-dimensional (layer-by-layer growth) to three-dimensional nucleation via island formation. It was also found that the occurrence of irregular growth surfaces of epitaxial layers was dependent upon inhomogeneous lattice strains induced by the formation of islands. A possible role of lattice strain for the formation of irregular growth surfaces was also discussed.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 5388-5390 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the phototransmission measurement of strained-layer InxGa1−x As/GaAs single quantum well structures at room temperature. The spectra obtained show distinct features of excitons in the single quantum wells. Fitting of the phototransmission spectrum indicates that the excitonic transition energy modulation is the main mechanism. The phototransmission can be used as a supplement to photoreflectance due to its sensitivity and convenience.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 3662-3667 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The initial molecular beam epitaxy growth of GaN on GaAs(001) was studied by real-time monitoring of the (3×3) surface reconstruction and its transition to an unreconstructed (1×1). Various growth conditions were established by variation of the V/III ratio, i.e., the Ga flux. We characterized the effect of the first two strained GaN monolayers: a N-terminated GaN (3×3) monolayer and a second unreconstructed (1×1) monolayer. A series of samples were grown under N-rich, Ga-rich, and near-stoichiometric growth conditions. The resulting morphology of the interface region was analyzed by high-resolution scanning electron microscopy, Auger-electron spectroscopy, and double crystal x-ray diffractometry. The N-rich and Ga-rich conditions resulted in extensive defect formation due to the nitridation damage of the GaAs substrate. The extent of this was found to be determined by the properties of the first GaN monolayer. The surface roughness under optimum growth conditions could be as low as ∼20 nm, defined by nanocrystalline grains, showing no observable nitridation damage. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 1954-1958 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A series of 0.7 μm thick GaN layers have been grown by solid-source rf-plasma assisted molecular beam epitaxy on sapphire (0001) substrates with the addition of 0.10%–3.30% Al. The Al concentration was determined by secondary ion-mass spectrometry and Auger-electron spectroscopy, while the layer quality was assessed by photoluminescence, Hall effect measurement, and high-resolution scanning electron microscopy. Microscopy revealed a surface roughness varying with Al content. The smallest surface roughness was obtained at 0.10% and 3.30% Al. Low-temperature photoluminescence revealed dominating peaks attributed to the neutral donor-bound exciton. Its energy increased slightly with Al concentration, which established a correlation between the Al concentration and the band gap. The surface morphology, the corresponding optical and electrical properties, showed a clear improvement of the GaN layer quality for the range of 0.10%–0.17% Al content. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 6556-6558 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Growth by molecular-beam epitaxy and characterization of Si-doped and unintentionally doped Ga1−xInxSb layers in the full compositional range on GaAs substrates are reported. The grown samples were characterized by reflection high-energy electron diffraction, x-ray diffraction, Hall-effect measurements, and secondary-ion-mass spectroscopy. The unintentionally doped layers had carrier concentrations below 6×1016 cm−3 with a maximum at x≈ 0.5, where the conduction switched from p to n type. Silicon doping in the 1017 cm−3 range provided acceptors up to x≈0.85 for a growth temperature of 430 °C. For higher x values conduction was mixed and the Hall-effect data suggest that an inversion layer of electrons could be present on the surface. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 5932-5940 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A detailed photoluminescence investigation of the effects of Al doping on GaAs grown by molecular-beam epitaxy is reported. Materials with 0.1%, 1%, and 3% Al doping have been studied. Viewed as an AlxGa1−xAs alloy semiconductor, our study on these materials presents results on the optical characteristics of the lowest Al composition material reported to date. Photoluminescence spectra show three major peaks. Detailed measurements on the dependence of these spectra on temperature and excitation power have been carried out to characterize the various transitions responsible for the luminescence peaks. A near-band-edge exciton peak, a carbon acceptor-related free-to-bound transition, and a defect complex-related luminescence peak, probably involving silicon, are identified as the main features of our luminescence spectra. The integrated luminescence intensity shows a strong quenching with the increase in Al doping, thus supporting the increase of nonradiative deep-level centers with Al doping, concluded from our earlier reported deep level transient spectroscopy study. The relative intensity of the excitonic peak shows a stronger decrease than that of the other luminescence features. New data on the shift of the excitonic transition energy with Al content x in AlxGa1−xAs, for the lowest x values yet reported, are provided by our photoluminescence study. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 1178-1182 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence and absorption spectra of strained InGaAs/GaAs single quantum well (SQW) and multiple quantum well (MQW) structures as a function of well width have been investigated in detail. It has been demonstrated that the strength of the exciton-LO phonon coupling is quite stronger in InGaAs/GaAs SQW structures than that of InGaAs/GaAs MQW structures by aid of the temperature-dependent linewidth analysis. The critical temperature for the excitonic polariton-mechanical exciton transition in InGaAs/GaAs quantum well structures is found to be ∼35 K. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5035-5041 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of Al as an isoelectronic dopant have been investigated on the deep level defects in GaAs grown by molecular-beam epitaxy (MBE), using deep level transient spectroscopy. Two different compositions containing 0.1% Al (Al0.001Ga0.999As) and 1% Al (Al0.01Ga0.99As) have been studied. At least nine different deep levels have been detected. Their detailed characteristics consisting of emission rate signatures, capture cross sections, concentrations, and junction depth profiles have been determined. The deep levels observed have been compared with the M levels normally found in MBE n-GaAs. The emission rates of deep levels have been found to shift to higher values with decrease in Al concentration. This fact has been attributed to lattice strain and random alloy effects. The relative concentrations of deep levels are seen to undergo large changes as the Al concentration is increased from 0.1% to 1%. Al doping upto 0.1% does not seem to reduce the deep level concentration, unlike the case of other isovalent dopants such as In and Sb in MBE GaAs. Further increase in the Al doping to 1% is found to lead to a pronounced increase in the overall deep level concentration. These data along with the other measured characteristics are interpreted in terms of the possible models for the various defects. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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