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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3325-3329 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By combining photoluminescence and optical deep-level transient spectroscopy measurements, we have investigated the presence of a native acceptor level H01 situated at 0.32 eV above the valence band, in n-type Si-doped liquid-encapsulated Czochralski GaAs grown in stoichiometric and Ga-rich conditions. The concentration of H01 decreases when increasing the [Ga]/[As] ratio up to a critical threshold of 1.3. For [Ga]/[As] ratio greater than 1.3, H01 disappears and another acceptor level, H02 (Ev+0.23 eV), is detected. H02 is identified as the double-acceptor level of the gallium antisite GaAs. Photoluminescence results show the presence of a high-intensity 1-eV band which disappears for [Ga]/[As] ratios greater than 1.2. The annihilation of this band is accompanied by the appearance of two emission bands centered at 0.95 and 1.2 eV. The dependence of the free-carrier concentration on the presence of H01 is interpreted in terms of a complex defect formed by a gallium vacancy and silicon impurity which can be the possible origin of this defect. Finally, the evolution of native electron traps present in these samples, with [Ga]/[As] ratio, is also interpreted to give more information about the origin of the EL6 center in GaAs.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 4039-4045 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of growth temperature and thermal treatments on the luminescence properties of SiGe/Si heterostructures grown by rapid thermal chemical-vapor deposition is reported. While the excitonic luminescence of the strained Si1−xGex layer is observed in the samples grown above 700 °C, the signal completely disappears for deposition temperatures lower than 650 °C. After rapid thermal annealing, we show that a drastic improvement of the luminescence efficiency of the layers deposited at low temperatures is obtained. A spectral blue shift of the excitonic luminescence can also be observed and is interpreted in terms of interdiffusion of Si and Ge atoms during the heating process. The photoluminescence spectra after a rapid thermal annealing at 1050 °C have been used for the first time to perform an accurate study of the thermal stability of strained Si0.85Ge0.15 alloys. It is shown that when the layers are in a metastable state before annealing, the relaxation phenomenon leads to a photoluminescence signal which consists of both band-edge and dislocation-related recombinations. In this case, the strain relaxation is mainly attributed to the formation of misfit dislocations at the SiGe/Si heterointerface. In very thin SiGe layers, only the band-edge luminescence can be observed, but it is shifted to the high-energy side as expected by the interdiffusion model. Using a simple theoretical approach, this shift can be used to calculate the interdiffusion coefficient in good agreement with the literature data. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2441-2446 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Previously reported results on deep level optical spectroscopy, optical absorption, deep level transient spectroscopy, photoluminescence excitation, and time resolved photoluminescence are reviewed and discussed in order to know which are the mechanisms involved in electron capture and emission of the Ti acceptor level in GaP. First, the analysis indicates that the 3T1(F) crystal-field excited state is not in resonance with the conduction band states. Second, it is shown that both the 3T2 and 3T1(F) excited states do not play any significant role in the process of electron emission and capture. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 5554-5559 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Semi-insulating and n-type conductor titanium (Ti) doped CdZnTe has been investigated by deep level transient spectroscopy, deep level optical spectroscopy and photoinduced current transient spectroscopy. A main electron trap at 0.82 eV is detected and its electrical and optical characteristics are given. The σno optical cross section spectrum of this level exhibits a resonance band attributed to the internal transition of the Ti2+ ion in CdZnTe. Starting from this identification, this deep trap is formally proposed to be the Ti2+/Ti3+ single donor level. The semi-insulating properties of the CdZnTe:Ti are interpreted in relation to this deep donor. Finally, the impact of the optical cross sections σno and σpo of this level on the photorefractive behavior of CdZnTe crystal is also discussed. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1696-1698 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Deep level transient spectroscopy, deep level optical spectroscopy, and optical absorption experiments were carried out in n- and p-type Ti-doped GaP crystals grown by the liquid encapsulated Czochralski technique. The single acceptor level of substitutional titanium Ti3+/Ti2+ was identified by deep level transient spectroscopy at an energy of 0.50±0.02 eV from the conduction band. The Ti2+ intracenter transitions were detected by deep level optical spectroscopy and optical absorption about 0.63 and 1.03 eV. The Ti4+/Ti3+ donor level was found at about 1±0.2 eV from the top of the valence band. The position of these two levels is found in complete agreement with the position of titanium-related levels in GaAs and in InP.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A complete quantitative analysis of electrical and optical properties is carried out on the vanadium transition metal in semi-insulating and n type conductor Cd0.96Zn0.04Te crystals using deep level transient spectroscopy, deep level optical spectroscopy, and photoinduced current transient spectroscopy. Four deep levels are mainly detected, with activation energies at Ec−0.95 eV, Ec−0.78 eV, Ev+0.68 eV, and Ev+0.2 eV. Their electrical and optical characteristics (thermal and optical cross sections, concentrations, and apparent activation energies) are determined. The 0.68 eV hole level and the 0.95 eV electron trap are related to the vanadium doping. These two levels are proposed to be originated from the same defect that interacts with the valence and conduction band, respectively. We have demonstrated that the 0.95 and 0.78 eV electron traps present capture barrier energies with values of 0.2 and 0.15 eV, respectively. The observed resonance bands on the optical cross sections σno and σpo of the 0.95 eV level are attributed to d→d* internal transitions of the V2+(3d3) and V3+(3d2) ions on Cd sites, respectively. Based on the above result, the 0.95 eV level is formally identified to the V2+/V3+ single donor and its real thermal ionization energy locates it near the midgap at 0.75 eV below the conduction band. This level is shown to be the donor trap that explain the semi-insulating character of the V doped CdZnTe materials. It is shown also that the 0.78 and 0.95 eV play a key role in the photorefractive properties of the V doped CdZnTe crystals. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 3126-3130 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied p-type vanadium-diffused InP by deep-level transient spectroscopy. A level at 0.21 eV above the valence band is observed at a concentration comparable to that of vanadium. This level is interpreted as the V3+/V4+ donor state of vanadium in agreement with photoluminescence excitation experiments on n-type InP:V. Measurement of the photoneutralization cross section allows us to observe, for the first time, an excited state of a transition metal ion in resonance with the valence band. This observation confirms the charge state of the level that we have found.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 2038-2043 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied by deep-level transient spectroscopy and deep-level optical spectroscopy n-type chromium-doped InP. We definitively confirm that the Cr2+/Cr3+ acceptor state is positioned at EC −0.4 eV in InP. We have measured for the first time the absolute values of the photoionization cross sections of Cr2+ in InP by deep-level optical spectroscopy. The σ0n cross section exhibits both a resonant and a nonresonant character. The former corresponds to the internal transition 5T2→5E of Cr2+, while the latter is attributed to the photoexcitation from the Cr2+ to the conduction band. The threshold of this transition at EC −0.41 eV indicates a very small Franck–Condon shift. The scales of the absolute photoionization values (σ0n) and photoneutralization (σ0p) cross sections towards the conduction and valence bands are the same, which seems to indicate no selection rules.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 60 (1992), S. 983-985 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In this letter are reported admittance spectroscopy experiments on Yb-doped p- and n-type InP grown by the synthesis method. The purpose is to give a clear understanding of the rare-earth ion electrical behavior. In p-type material, the results indicate the presence of two peaks in the conductance spectra at low temperature. The activation energies of these levels have been found to be 42±5 and 50±5 meV above the valence band. We attribute them to Mg and Yb, respectively. In n-type material, the conductance spectra present a peak at low temperature with an activation energy of 29±3 meV below the conduction band and we attribute it to Yb ion. To explain the origin of these Yb-related traps, we propose that this ion acts as an isoelectronic trap in InP.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2986-2988 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This work reports on photoluminescence (PL) characterization of heavy boron-doped SiGe(p+)/Si(p) heterostructures and Si(p+)/Si(p) pseudoheterostructures grown by rapid thermal chemical vapor deposition. For the pseudoheterostructures, the band-gap narrowing is measured in the 4×1018–1.5×1019 cm−3 doping level range in very good agreement with bulk silicon results. The band-gap narrowing of SiGe strained layers has been determined for the first time, by means of PL measurements on boron-doped Si0.82Ge0.18 strained alloy up to 4×1019 cm−3. The reduced band gap of the Si0.82Ge0.18 alloy is deduced, taking into account both strain and heavy doping effects and compared to band-gap narrowing found in Si.
    Type of Medium: Electronic Resource
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