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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 4171-4175 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrical and optical properties of erbium-doped and ytterbium-doped GaAs are reported in this article. The studied samples are semi-insulating and have been grown by molecular beam epitaxy. The Yb and Er concentrations in the GaAs epitaxial layers measured by secondary ion mass spectroscopy are 2–3×1017 cm−3. The photoluminescence of Yb intra-4f shell has not been observed, while that of Er has been widely reported. Photoinduced current transient spectroscopy measurements (PICTS) reveal that the Yb doping (Er doping) creates a level in the gap with an activation energy of 0.65 eV (0.67 eV). The depth of such levels may be responsible for the absence of Yb 4f photoluminescence in GaAs:Yb. Moreover, photoconductivity experiments show the presence of rare earth related traps. The energies of these traps correspond exactly to the difference between the gap energy and the corresponding activation energy found by PICTS. These observations confirm the excitation model based on the energy transfer from recombination to the rare earth transitions.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3325-3329 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By combining photoluminescence and optical deep-level transient spectroscopy measurements, we have investigated the presence of a native acceptor level H01 situated at 0.32 eV above the valence band, in n-type Si-doped liquid-encapsulated Czochralski GaAs grown in stoichiometric and Ga-rich conditions. The concentration of H01 decreases when increasing the [Ga]/[As] ratio up to a critical threshold of 1.3. For [Ga]/[As] ratio greater than 1.3, H01 disappears and another acceptor level, H02 (Ev+0.23 eV), is detected. H02 is identified as the double-acceptor level of the gallium antisite GaAs. Photoluminescence results show the presence of a high-intensity 1-eV band which disappears for [Ga]/[As] ratios greater than 1.2. The annihilation of this band is accompanied by the appearance of two emission bands centered at 0.95 and 1.2 eV. The dependence of the free-carrier concentration on the presence of H01 is interpreted in terms of a complex defect formed by a gallium vacancy and silicon impurity which can be the possible origin of this defect. Finally, the evolution of native electron traps present in these samples, with [Ga]/[As] ratio, is also interpreted to give more information about the origin of the EL6 center in GaAs.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 61 (1992), S. 2583-2585 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoinduced current transient spectroscopy has been used to show the effect of thermal annealing on deep level defects in semi-insulating Fe doped InP wafers. The annealing experiments have been accomplished in an infrared image furnace during 15 min at temperatures ranging from 663 to 820 °C. We show that this treatment leads to the formation of four deep traps named T1–T4 having the following activation energies: 0.14, 0.21, 0.41, and 0.53 eV, respectively. We show that the thermal anneal at high temperature leads to deterioration of the electrical properties of the material.
    Type of Medium: Electronic Resource
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