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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Silicided p+n junctions and contact resistivity test structures were formed by implantation of BF2 through TiSi2 in crystalline as well as in Si+ or Ge+ preamorphized silicon. A subsequent rapid thermal annealing at 950 °C in nitrogen atmosphere was performed to activate the dopant, to remove the ion implantation damage, to increase the silicide conductivity, and to improve the electrical characteristics of the junction. Very low leakage currents and low contact resistivities were measured on samples without preamorphization. With Si+ or Ge+ implantation the channeling of boron was suppressed but residual defects below the original amorphous-crystalline (a-c) interface gave rise to an increased leakage current. A Ti-related defect level was found by deep level transient spectroscopy in the silicon substrate up to a depth of some micrometers.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 815-817 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Rapid thermal annealing of Ti/Si couples has been investigated by transmission electron microscopy using cross-section preparation, four-point probe measurement of sheet resistance, and Auger electron spectroscopy. The development of crystalline phases was determined in this way with high spatial and temporal resolution. Our results indicate the decisive influence of the solubility of oxygen on the phase sequence.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 4066-4068 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The correlation between the copper-induced deep centers with Ev+0.1 eV and the appearance of luminescent copper centers, leading to a characteristic line spectrum with the most intense Cu00 no-phonon line at 1.014 eV, has been examined using deep level transient spectroscopy (DLTS) and photoluminescence (PL). Concentrations of the 0.1 eV copper centers ranging from 1011 to about 1014 cm−3 were obtained by a copper contamination treatment of floating zone p-type silicon samples without quenching. The dependence of the Cu00 line intensity on the excitation power in the transition region to intensity saturation was used to determine the saturation intensity ICusat, which represents the concentration of luminescent copper centers. The saturation intensities and therefore also the concentrations of luminescent copper centers, show a linear dependence on the concentrations of the 0.1 eV deep centers with good correlation, suggesting that the same Cu-induced centers are detected by DLTS and PL. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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