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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of hydrogen treatment on electrical properties, luminescence spectra, and deep traps in InGaAlP and InGaP have been studied. It is shown that acceptors and donors (both shallow and deep) can be effectively passivated by hydrogen. The hydrogen is found not only to passivate the main electron and hole traps in our samples, but also to generate electron traps in n-InGaAlP and hole traps in p-InGaP. The influence of hydrogen treatment mode (direct plasma or a crossed-beams source in which the low-energy ion bombardment of the surface is effectively eliminated) on hydrogen concentration and hydrogen profiles in InGaAlP are discussed. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 2002-2010 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Specimens from n-type GaAs wafers have been annealed at high temperature (900–1050 °C) and then characterized using deep-level transient spectroscopy (DLTS) and electron-beam-induced current techniques. Relatively short anneals result in substantial changes to the electron trap structure in this material. Diffusion lengths are, at best, marginally increased by short (16 min and below) anneals but have been found to be significantly increased by longer anneals of between 40 and 80 min. DLTS measurements of hole traps in both unannealed and annealed n-type material suggest that a hole trap we term HCX may be an important recombination center in this class of material. The results obtained demonstrate the effectiveness of wafer annealing as a technique for creating a (10 μm deep) near-surface zone in n-type bulk material in which defects are suppressed and diffusion lengths improved.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 5464-5468 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence (PL) and transmission electron microscopy have been used to study strained InxGa1−xAs/GaAs (x=0.24–0.28) quantum wells (QWs) grown by molecular-beam epitaxy. The three QWs grown without growth interruptions produce high intensity PL peaks of narrow full width at half-maximum (2.9 meV). On the other hand, the PL peaks in the QWs grown with 30-s interruptions are relatively broad, less symmetric, and show lower PL intensities, compared with the noninterrupted QWs. Our results show that high-quality strained InxGa1−xAs/GaAs QWs can be grown without growth interruptions.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 1245-1250 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Circular gold dots, measuring about 200 μm in diameter and either 150 or 300 nm in thickness, have been produced on {100}, {110}, and {111} substrates of indium phosphide by a combination of vapor deposition and photolithographic processing, annealed at temperatures ranging from 420–460 °C, and subsequently examined by optical microscopy. During annealing, a reaction product, bounded by well-defined crystallographic planes of the substrate, forms, expands parabolically with annealing time, and eventually saturates due to the limited supply of gold. Generally, reactions proceed at least three times faster at {100} and {110} planes than at {111}In planes, in which reactions proceed about three times faster than at {111}P planes. Analysis of concomitant reaction kinetics yields an activation energy of 8.6±3.0 eV for reactions at {111}In planes. Results are interpreted in terms of a preferential interfacial reaction at {111}In planes, which is controlled by solid-state diffusion and eventual escape of phosphorus.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 5489-5489 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 5047-5050 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Horizontal Bridgman grown n-type GaAs is shown to contain two important electron traps EL6 (0.35 eV) and EL2 (0.80 eV) in the 1015 cm−3 concentration range. A heat treatment at 800 °C for 1 h results in the reduction of EL6 to about 1013 cm−3 to a depth of at least 10 μm and an increase in EL2 by an amount about equal to the reduction of EL6. Measurement of the minority-carrier (hole) diffusion lengths in this depth range by an electron beam induced current (EBIC) technique shows an inverse correlation with the concentration of the EL6 trap. The results may be explained if EL6 is assumed to be VGa-VAs, EL2 to be AsGa-VAs, and the interaction between the two traps to involve Asi.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 5440-5443 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of starting semi-insulating GaAs conditions on Si-implantation activation efficiency have been studied by capacitance deep level transient spectroscopy, 4.2-K photoluminescence, and thermally stimulated current spectroscopy. Experimental evidence shows that samples with good Si activation efficiency have higher EL2 trap concentration, compared with samples with a lower activation efficiency, and a higher density of trap T2 at Ev +0.49 eV believed to be the native defect AsGa++. For samples with a lower activation efficiency, a deep trap T3 attributed to either VAs or GaAs −VGa appears at Ev +0.44 eV with a concentration larger than that of T2. A PL emission at 1.44 eV due to GaAs or its related complex is observed in the samples with a lower activation efficiency, but not in samples with good activation efficiency. Comparison between samples grown under Ga-rich or As-rich conditions and samples that show different activation efficiencies confirms that growth stoichiometric conditions largely determine the Si implantation activation efficiency.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 1063-1067 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A simple and accurate expression is developed for profiling deep-level traps in semiconductors using Schottky barriers and deep-level transient spectroscopy (DLTS). Through the use of computer simulations as well as the application to actual experimental results it is shown that the standard expressions which are generally employed can result in large errors in the calculated trap concentration near the metal semiconductor interface. It is also pointed out that the standard DLTS expressions will result in large differences in the calculated trap concentrations for donorlike or acceptorlike traps when the trap concentration is comparable to the shallow level concentration.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 3497-3504 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of isoelectronic doping of GaAs by In or Sb on the electron deep levels in n-GaAs grown by molecular-beam epitaxy have been investigated in the growth temperature range 500–600 °C for Si doping levels of 4–7×1016 cm−3 and As-stabilized conditions. The two dominant traps M3 and M6 are drastically reduced in concentration by up to three orders of magnitude for M3 (from 1015 cm−3 down to 〈1012 cm−3) and two and a half orders of magnitude for M6 by introducing 0.2–1 at.% In or Sb and increasing growth temperatures from 500 to 550 °C. The trap concentrations of M3 and M6 were also significantly reduced by increasing the growth temperature to 600 °C without In or Sb doping and by decreasing the growth rate from 1.0 to 0.3 μm/h. The incorporation coefficients of In and Sb have been measured and are found to decrease with increasing growth temperature. The growths with high M3 and M6 trap densities are shown to have short minority-carrier diffusion lengths. Indium isoelectronic doping, which is presumed to take place on a gallium sublattice site, and Sb doping, which is expected to take place on an arsenic sublattice site, appear to have rather similar effects in suppressing the concentration of the M3 and M6 electron traps. This suggest that both of these traps are in some way related to (VAsVGa) complexes or (VAsXVGa) complexes where X is different for M3 and M6 and might be interstitial or impurity related.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 5303-5307 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of the nonabrupt depletion edge (the Debye tail) on the trap concentrations obtained by deep-level transient spectroscopy are discussed. In depth profiling of traps it is shown that a dramatic drop in the apparent deep-trap concentration is obtained near the edge of the total depth probed. This is an artifact of the measurement and is a consequence of the Debye tail in the depletion edge. It is shown that experimentally one can avoid this problem by using sufficiently large reverse biases and forward filling pulses to determine the deep-trap concentration in any particular region of the semiconductor.
    Type of Medium: Electronic Resource
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