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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 5427-5432 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The electrical transport properties of CoSi2 and Co(SixGe1−x)2 thin films formed by solid state interaction and co-evaporation in the range of 4–300 K were studied. The Hall effect data indicate a hole carrier conduction in all samples. The rapid thermal annealed CoSi2 exhibits a typical metallic conduction with a residual resistivity of 3.3-μΩ-cm and room-temperature (RT) resistivity of 15 μΩ cm. The co-evaporated CoSi2 and Co(Si0.9Ge0.1)2 films after low temperature annealing up to 250 °C show a low resistivity of 70–80 μΩ cm at RT and change little down to 4 K. The hole carrier density of all the samples studied has values close to 2–3×1022 cm−3, while the carrier Hall mobility has large differences.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 2126-2128 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the effect of annealing polycrystalline YBa2Cu3O7−δ samples in a He ambient and in vacuum, on the composition of their internal surfaces. X-ray photoelectron spectroscopy (XPS) data indicate a decrease in the amount of BaCO3 but a higher proportion of Ba at the near-surface region upon low-temperature annealing in He or vacuum. The latter effect seems to derive from the presence of a surface barrier for oxygen outdiffusion, and can be prevented by diffusing Ag into the polycrystalline sample. Changes in the cutoff energies of the ultraviolet photoelectron spectra indicate that a submonolayer coverage of Ag is sufficient to produce a change in the work function of 0.3 eV, corresponding to the lowering of the surface barrier.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 1464-1467 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A novel silicon surface barrier detector has been constructed for low-energy electron spectroscopy. This detector consists of a high-resistance silicon wafer which is sandwiched between a rectifying barrier front and ohmic back contacts. The front electrode is a gold mesh metallization with an effective area of 8% of the detector surface. This electrode allows most of the electrons to reach the active region of the detector with the smallest possible degradation in their energy distribution due to electron straggling in the front electrode.
    Type of Medium: Electronic Resource
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