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  • 1
    Electronic Resource
    Electronic Resource
    Direct, high throughput LIGA for commercial applications: a progress report (2000)
    Springer
    Microsystem technologies 6 (2000), S. 103-105 
    Details
    ISSN: 1432-1858
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Technology
    Notes: Abstract Direct LIGA; LIGA without injection molding; has the potential to become a cost effective, high throughput form of LIGA. The process requires high energy photons; near 20,000 eV; which are best produced in facilities such as the X-ray ring at Brookhaven National Laboratory. The increased absorption lengths over lower energy photons eliminates the need for a membrane type X-ray mask. This in turn facilitates very large area X-ray masks fabricated from standard silicon wafers with 20 μm gold absorbers. The absorption length increase in PMMA to 2 cm is used to implement stacked PMMA exposures in which 1 mm thick PMMA layers are used to produce exposed PMMA sheets. These sheets are eventually solvent bonded to working substrates with plating bases. New high energy X-ray masks have been developed. Two exposure stations at Brookhaven are operational. The recently commissioned manufacturing exposure station which uses a 22 inch scanner which can expose four separate PMMA-mask combination is in the testing phase.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s005420050007
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Large area, cost effective X-ray masks for high energy photons (2000)
    Springer
    Microsystem technologies 6 (2000), S. 117-120 
    Details
    ISSN: 1432-1858
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Technology
    Notes: Abstract The cost effectiveness of the deep X-ray lithography and electrodeposition process, LIGA, depends directly on the throughput of the process. The use of high energy photons allows the exposure of stacked photoresist and results in high throughput. High energy X-ray exposures require a different mask than low energy X-ray exposures. The high energy mask allows a large area exposure but requires a thicker X-ray absorber. The cost of generating high energy X-ray masks can be drastically reduced by using a thick optical photoresist process rather than an X-ray exposure process. The cost can be further reduced by using alternatives to the typical X-ray absorber, gold. High atomic weight (high Z) materials are ideal absorbers. Lead has been demonstrated as being a useable alternative as an X-ray absorber.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s005420050011
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
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