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  • 1
    Electronic Resource
    Electronic Resource
    Multicarrier characterization method for extracting mobilities and carrier densities of semiconductors from variable magnetic field measurements (1993)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 8324-8335 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A simple, practical method is described to extract the carrier concentration and mobility of each component of a multicarrier semiconductor system (which may be either a homogeneous or multilayered structure) from variable magnetic field measurements. Advantages of the present method are mainly due to the inclusion of both the longitudinal and transverse components of the conductivity tensor and normalization of these quantities with respect to the zero-field longitudinal component of the conductivity tensor. This method also provides a simple, direct criterion by which one can easily determine whether the material under test is associated with a one-carrier or multicarrier conduction. The method is demonstrated for a simple one-carrier system [GaAs single-channel high-electron-mobility-transistor (HEMT) structure] and two multicarrier systems (an InGaAs-GaAs double-channel HEMT structure and two types of carriers present in an InGaAs single-channel HEMT structure). The analysis of the experimental data obtained on these samples demonstrates the utility of the method presented here for extracting carrier concentrations and mobilities in advanced semiconductor structures.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.353424
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Formation of epitaxial Si1−xGex films produced by wet oxidation of amorphous SiGe layers deposited on Si(100) (1988)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 2483-2485 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial SiGe/Si structures have been formed by wet oxidation of amorphous SiGe films. Amorphous, 1000-A(ring)-thick Si0.86Ge0.14 films were electron beam evaporated onto RCA cleaned Si(100) substrates at a background pressure of 1×10−7 Torr. They were then wet oxidized in an open tube furnace, at 900 °C for various times. They have been examined by reflective high-energy electron diffraction and Rutherford backscattering. Results indicate the formation of an epitaxial SiGe layer following the oxidation, whereas a polycrystalline layer forms following a vacuum or nitrogen ambient anneal. It is suggested that the oxide contamination at the amorphous SiGe/Si interface is too high to allow solid phase epitaxial growth to occur in an oxygen-free ambient, but during the oxidation process, some native oxide is dissolved due to a gradient of silicon from the substrate to the growing SiO2 on the surface. This allows grains of the SiGe alloy to orient with respect to the substrate, and secondary grain growth occurs during the oxidation process.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.100220
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Laser effects in silicon with deep amorphous layer (1979)
    Springer
    Applied physics 20 (1979), S. 353-356 
    Details
    ISSN: 1432-0630
    Keywords: 61.70 ; 61.80
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The effects of single-pulse ruby laser irradiation have been investigated in Si samples with disorder layers located at a depth of 2000 Å from the crystal surface and extending up to 8000 Å. This disorder was obtained by implantation with 350 keV N+ to a fluence of 2×1016/cm2. Channeling, diffraction and transmission electron microscopy were used to characterize the structure of the irradiated layers. After 1.5 J/cm2 irradiation the damaged layer reorders partially, while for about 2.0J/cm2 the surface single crystal becomes polycrystalline. At a higher energy density all the material undergoes the transition to single crystal. Calculations based on the liquid model accounts in part for the experimental results.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00895009
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    Paper (German National Licenses)
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