ISSN:
1436-5073
Keywords:
electron-probe microanalysis (EPMA)
;
light elements (C, N, O)
;
thin films
;
organo-silicon polymers
;
hydrogen
;
chemical state
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
Notes:
Abstract Amorphous Si∶C∶N∶O∶H films (1–3 μm) are studied by EPMA after deposition of gold (1–5 nm) as a conductive coating. Its influence on thek-ratios (X-ray intensity relative to an uncoated standard) of silicon, carbon, nitrogen and oxygen is described as a linear function of the simultaneously determinedk-ratio of gold. Thek-ratios representing the uncoated specimen are obtained by extrapolation and, in combination with the PAP matrix correction model, quantitative EPMA can be performed with an analytical error of 2–5%, as it is demonstrated by samples of SiC, Si3N4 and SiO2. No systematic shift of the concentrations is observed for layers ofa-Si∶C∶N∶O∶H determined at various electron energies of 5–12.5 keV. Hydrogen is calculated by difference and the concentrations prove to be a useful estimate in agreement with the results of chemical analysis. Si-Kβ/Si-Kβ′ spectra recorded on organo-silicon films and binary silicon compounds point out significant differences concerning the formation of Si-C, Si-N and Si-O chemical bonds.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01244599
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