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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 1600-1606 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of power on the electrical and interface properties of silicon dioxide films produced by direct plasma-enhanced chemical-vapor deposition, using nitrous oxide and silane with high helium dilution, has been investigated. Auger depth profiling measurements indicate that while the bulk of the films have no measurable impurities, the interface region contains about 1.6×1015 atoms/cm2 of nitrogen. In contrast to thermal oxides, there is no thick interface layer with a large intrinsic compressive stress. The interface-state densities of the films obtained from capacitance-voltage measurements on metal-oxide-semiconductor diodes increase with increasing plasma power, but these can be removed to some extent by high-temperature annealing at temperatures in the range 800–950 °C. The flatband voltage is relatively insensitive to plasma power. Thermal oxide samples have been subjected to the plasma processes and these also show evidence of plasma damage. A thin layer produced at the interface by a separate plasma oxynitridation process is shown to be incapable of protecting the Si/SiO2 interface from the plasma damage produced by subsequent high-power plasma deposition processes. The nature of the interface states is discussed.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High quality silicon dioxide films have been produced using a direct plasma-enhanced chemical vapour deposition process with silane, nitrous oxide and helium that leaves a nitrided layer at the Si-SiO2 interface. X-ray photoelectron spectroscopy coupled with etch-back of the films has shown that the interface nitrogen is incorporated by nitridation of the silicon surface. Fowler–Nordheim injection measurements on thin films annealed after deposition for 1 minute at 950 °C show that the neutral-trap generation and interface state generation rates are comparable to that of thermal oxide if a proper deposition power is chosen. The data is consistent with an interpretation in which fast donor states, not Pb centres, account for almost all of the increase in the charge trapped at the interface. Too high deposition powers lead to excessive nitrogen and higher interface state generation rates. It is proposed that improved performance under hot-electron stress could be obtained by using an optimal deposition power to obtain an optimal nitrogen concentration followed by annealing in oxygen. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3859-3864 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To understand the nature of resonant tunneling in triple-barrier/double-quantum-well structures, we have investigated the properties of transmission probability TT of such structures with use of the transfer-matrix method. The transfer matrix of the middle barrier is calculated to analyze the amplitude decay, the phase shift, and the coupling effects that are induced between the two quantum wells. The dependencies of TT and the splitting of the resonant peaks on the middle-barrier thickness, the well width, and the symmetry of the structures are calculated. The origin of the transmission resonance and the resonant condition for symmetric (equal well widths) and asymmetric structures are discussed. The variations of TT with the applied voltage are also analyzed. The calculation results lead to some suggestions on how to design triple-barrier structures with improved performance.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2500-2502 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the resonant tunneling feature variations with temperature in molecular beam epitaxy grown strained Si0.78Ge0.22/Si double-barrier structures with different well width w and spacer thickness LS. Both w and LS have strong effects on the temperature characteristics of the peak current JP, the valley current JV, and the current peak-to-valley ratio (PVR). When w is reduced, both JP and JV are greatly increased. The resonant tunneling devices (RTDs) also have better temperature stability and PVR decreases slower. The RTD with larger LS has higher peak current. Beside w and LS, the quasi-Fermi level position has a very important influence on the resonant tunneling feature variations, which is stressed in the present work.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3365-3369 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new approach to analyze the transport characteristics of resonant tunneling structures has been developed. It is shown that the Fermi-level Ef position per se, the temperature variations of the Fermi-level, the effective mass, and the mobility, have important influences on the resonant tunneling transport properties. Both calculations and experiments have shown very different features for heavy-hole and light-hole resonant tunneling in SiGe/Si resonant tunneling structures. These different features can for the first time be explained coherently. The calculated subband energy at current resonance can be much higher or lower than the Fermi level and the peak current can decrease or increase with temperature, depending on the device structure, the carrier type, and the working conditions. The calculations have predicted an interesting result that, in the low-temperature region, the valley current for the first heavy-hole resonance decreases with temperature, and that is confirmed by our experiments. The calculated temperature dependences of heavy- and light-hole transport, such as peak and valley currents/voltages and their variations with the well width, agree very well with our observations and other published results.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 738-740 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Temperature effects on current transport and the negative differential resistance for SiGe/Si and GaAlAs/GaAs resonant tunneling structures (RTS) have been studied, and the maximum working temperature Tm has been estimated. The calculations show that decreases in the carrier effective mass, well width and barrier thicknesses, lead to better temperature characteristics, implying higher peak current and larger peak-to-valley ratio (PVR) at higher temperature. These results are consistent with our experiment on SiGe/Si RTSs and other published experiments. The crucial role of nonresonant tunneling current Jnon in temperature effects for current transport is emphasized. Suggestions for optimizing RTS design to increase its Tm and PVR are discussed.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 72 (1998), S. 3097-3099 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The change in the second-order nonlinear susceptibility of an asymmetric quantum well (AQW) superlattice induced by ion beam-enhanced intermixing has been measured. The surface-emitted second-harmonic intensities radiated from implanted and masked areas of an AQW waveguide were measured and compared for incident wavelengths between λ=1480 and 1600 nm. Intermixing resulted in a 60 meV blueshift of the AQW band edge and a uniform suppression of the AQW second-order susceptibility, while the masked AQWs were unchanged. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 2655-2657 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We experimentally demonstrate surface-emitting second harmonic generation in a waveguide containing asymmetric coupled GaAs/AlGaAs quantum wells. The nonlinear conversion efficiency is enhanced by reversing the asymmetric well orientation every coherence length, in order to quasiphase match the vertical second harmonic generation process. The measured spectrum of the asymmetric quantum well susceptibility is dominated by an excitonic peak at a pump frequency corresponding to half of the first electron-heavy hole transition energy. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 3588-3590 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrical and structural properties of platinum monosilicide (PtSi) in deep submicron lines are reported. The sheet resistance of the silicide films was found to be rather independent of the linewidth down to dimensions as small as 0.15 μm. Plan-view and cross-sectional transmission electron microscopy was performed to study the structural properties of these films, including their gain structures and lateral growth. The insensitive nature of the electrical properties of the silicide films to the linewidths is correlated with their structural properties. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 977-979 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The residual ion damage due to low-energy ion implantation during molecular beam epitaxy growth was investigated by measuring the minority carrier lifetime in the base of a silicon bipolar transistor. The base was doped with As+ ions at 200 eV to a concentration of 1019 cm−3. Three samples were grown at temperatures of 500, 650, and 800 °C. The 500 °C sample had a minority carrier lifetime in the base ∼1/6 that of the samples grown at the higher temperatures. On annealing at 650 °C the lifetimes of all samples were essentially equal. The results indicate that at this dopant concentration the collision cascades caused by ion bombardment do not overlap. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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