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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Al–Ga interdiffusion, carbon acceptor diffusion, and hole reduction were studied in carbon doped Al0.4Ga0.6As/GaAs superlattices (SL) annealed under different ambient As4 pressure conditions in the temperature range of 825 °C–960 °C. The SL were doped with carbon to an initial acceptor concentration of ∼2.9×1019 cm−3. Al–Ga interdiffusion was found to be most prominent under Ga-rich annealing ambient conditions, with interdiffusivity values, DAl–Ga, turned out to be about two orders of magnitude smaller than those predicted by the Fermi-level effect model. Under As-rich ambient conditions, the DAl–Ga values are in approximate agreement with those predicted by the Fermi-level effect model. The hole concentrations in the SL decreased significantly after annealing under As-rich and As-poor ambient conditions, while those after annealing in the Ga-rich ambient were almost totally intact. By analyzing the measured hole concentration profiles, it has been found that both carbon acceptor diffusion and reduction have occurred during annealing. Both the carbon acceptor diffusivity data and the carbon acceptor reduction coefficient data are characterized approximately by a dependence on As4 pressure values to the one-quarter power. These As4 pressure dependencies indicate that carbon diffuses via the interstitialcy or interstitial–substitutional mechanism, while hole reduction is governed by a carbon acceptor precipitation mechanism.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 5206-5212 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Undoped 69GaAs/71GaAs isotope superlattice structures grown by molecular beam epitaxy on n-type GaAs substrates, doped by Si to ∼3×1018 cm−3, have been used to study Ga self-diffusion in GaAs by disordering reactions. In the temperature range of 850–960 °C, the secondary ion mass spectrometry (SIMS) measured Ga self-diffusivity values showed an activation enthalpy of 4 eV, and are larger than previously compiled Ga self-diffusivity and Al-Ga interdiffusivity values obtained under thermal equilibrium and intrinsic conditions, which are characterized by a 6 eV activation enthalpy. Characterizations by SIMS, capacitance-voltage (C-V), and transmission electron microscopy showed that the as-grown superlattice layers were intrinsic which turned into p type with hole concentrations of ∼2×1017 cm−3 after annealing, because the layers contain carbon. Dislocations of a density of ∼106–107 cm−2 were also present. However, the factor responsible for the presently observed larger Ga self-diffusivity values appears to be Si out-diffusion from the substrate, which was determined using C-V measurements. Out-diffusion of Si decreases the electron concentration in the substrate which causes the release of Ga vacancies into the superlattice layers where they become supersaturated. This Ga vacancy supersaturation leads to enhanced Ga self-diffusion in the superlattice layers.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 970-972 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: For producing ultrathin (〈0.1 μm) device quality silicon-on-insulator (SOI) films, commercially available 4-in. diameter (100) SOI wafers with single-crystal layer thickness of 1.5±0.5 μm were carbon-implanted (190 keV and 3×1016 cm−2) followed by bonding to oxidized Si wafers. The buried oxide in the SOI wafers was used as the first etch stop and the second etch was stopped at the implanted carbon peak. The formation of a carbon denuded zone allowed us to obtain ≤900±50 A(ring) SOI films free of carbon precipitation. Since precision polishing to thin one wafer of a bonded pair down to ±0.5 μm in thickness variation is available in industry, it should be possible to start the described SOI process with a bulk Si wafer, rather than an expensive SOI wafer, and obtain similar results.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 117-118 (Jan. 1993), p. 399-404 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 56 (1993), S. 249-258 
    ISSN: 1432-0630
    Keywords: 61.70.Bv ; 61.70.Tm ; 66.30.Jt
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract We have calculated the thermal equilibrium concentrations of the various negatively charged Ga vacancy species in GaAs. The triply-negatively-charged Ga vacancy, V Ga 3− , has been emphasized, since it dominates Ga self-diffusion and Ga-Al interdiffusion under intrinsic and n-doping conditions, as well as the diffusion of Si donor atoms occupying Ga sites. Under strong n-doping conditions, the thermal equilibrium V Ga 3− concentration, $$C_{V_{_{Ga} }^{3 - } }^{eq} (n)$$ , has been found to exhibit a temperature independence or a negative temperature dependence, i.e., the $$C_{V_{_{Ga} }^{3 - } }^{eq} (n)$$ value is either unchanged or increases as the temperature is lowered. This is quite contrary to the normal point defect behavior for which the point defect thermal equilibrium concentration decreases as the temperature is lowered. This $$C_{V_{_{Ga} }^{3 - } }^{eq} (n)$$ property provides explanations to a number of outstanding experimental results, either requiring the interpretation that V Ga 3− has attained its thermal equilibrium concentration at the onset of each experiment, or requiring mechanisms involving point defect non-equilibrium phenomena.
    Type of Medium: Electronic Resource
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