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  • 1
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 60 (1989), S. 3560-3562 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The IBM PC and its various clones have found extensive use in the analytical laboratory. Hardware advances have been paralleled by the development of high and low level languages which allow the programmer to better access the capabilities of the PC for instrument control and data acquisition. This paper reports on the design and implementation of a PC based digital interface for the Cameca IMS-3f, a commercial secondary ion mass spectrometer. The IMS-3f was originally interfaced to a Hewlett-Packard 9845B computer. The new interface is completely compatible with the PC architecture and the existing IMS-3f circuitry. Implementation of the PC interface has enabled the incorporation of other commercially available PC hardware to enhance the analytical capabilities of the IMS-3f.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 3829-3831 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In order to reduce the potentially deleterious corrosion effects associated with gases such as Cl2, I2, and XeF2, three noncorrosive organochlorides [pentachloroethane (C2HCl5), carbon tetrachloride (CCl4), and tetrachloroethene (C2Cl4)], have been investigated as more ideal chlorine sources for chemically enhanced focused ion beam micromachining (CE-FIBM) of Permalloy (Ni–Fe alloy). C2Cl4 increased the sputter yield of Permalloy by a factor of 2 while reducing micromachining generated topography from several micrometers (FIBM) to less than 100 A(ring) (CE-FIBM). Analysis of material removal rate versus pattern refresh time indicated that material removal occurred via a chemically assisted process. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 6 (1984), S. 15-20 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A quantitative approach to AES is illustrated for various metal-sulfur compounds involving: (a) intensity measurements via integral areas of background subtracted N(E) spectra (including sample probe potential biasing to improve background subtraction); (b) low primary electron dose, pulse-count spectrum acquisition to minimize primary electron beam damage and charging artifacts; (c) corrections to spectral intensity for variations in electron backscattering and inelastic Auger electron mean free path for each metal-sulfur compound matrix; (d) XPS quantitative analysis to correct for differences in surface vs. bulk stoichiometries. Although the above approach results in improved analytical precisions, a residual difference of greater than a factor of 2 remains in the Auger elemental sensitivity factor for sulfur (LMM) in corresponding metal sulfate vs. sulfide compounds. This suggests a chemical state dependent Auger electron yield (core level ionization cross section times the Auger transition probability). Accurate AES quantification, therefore, may require chemical state specific sensitivity factors, particularly for valence shell transitions.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    New York, NY : Wiley-Blackwell
    Journal of Electron Microscopy Technique 1 (1984), S. 299-309 
    ISSN: 0741-0581
    Keywords: Electron microscopy ; Ion microscopy ; Correlative microscopy ; Electron probe microanalysis ; Life and Medical Sciences ; Cell & Developmental Biology
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Natural Sciences in General
    Notes: In order to correctly interpret the chemical images obtained using ion microscopy (IM), it is useful to correlate them with the information provided by conventional light microscopy (LM), secondary electron imaging (SEI), backscattered electron imaging (BEI), and electron probe microanalysis (EPMA). Accordingly, we have devised a technique of specimen preparation which allows for the application of several different microanalytical techniques to a single histologic section mounted on the same substrate. Sections are cut onto polyester plastic coverslips (devoid of peaks for any element with atomic number 〉 9 using EPMA) and studied by LM. After a light rotary coating with carbon (to prevent charging), the section can then be examined by SEI, BEI, and EPMA. Specific areas can be marked for IM study either with an objective-mounted pin tissue microlocater, or by placing small pieces of metal foil, cut in specific geometric shapes, over features of interest. After sputter-coating the sample with platinum, metal-free shadows are visible using a low-power reflected light microscope available on a typical IM sample chamber as a guide for ion beam placement. The conductive coatings also minimize specimen charging during IM. Post-IM light microscopy, SEI, and BEI are used to confirm the location of specific areas probed in the IM experiments and to provide information on differential ion-sputtering artifacts and tissue contaminants. This new correlative technique should permit better understanding of the images obtained with these diverse instruments.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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