ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
In order to reduce the potentially deleterious corrosion effects associated with gases such as Cl2, I2, and XeF2, three noncorrosive organochlorides [pentachloroethane (C2HCl5), carbon tetrachloride (CCl4), and tetrachloroethene (C2Cl4)], have been investigated as more ideal chlorine sources for chemically enhanced focused ion beam micromachining (CE-FIBM) of Permalloy (Ni–Fe alloy). C2Cl4 increased the sputter yield of Permalloy by a factor of 2 while reducing micromachining generated topography from several micrometers (FIBM) to less than 100 A(ring) (CE-FIBM). Analysis of material removal rate versus pattern refresh time indicated that material removal occurred via a chemically assisted process. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.116631
