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  • 1
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Journal of Crystal Growth 53 (1981), S. 483-489 
    ISSN: 0022-0248
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Chemistry and Pharmacology , Geosciences , Physics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    X-Ray Spectrometry 11 (1982), S. 32-34 
    ISSN: 0049-8246
    Keywords: Chemistry ; Analytical Chemistry and Spectroscopy
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A method is described for the calibration of Ar Kα counting rates, measured using crystal spectrometers equipped with Ar-flow proportional counters. Linear extrapolation from overvoltage corrected x-ray yields of the elements with Kα x-ray energies lower than those of the ArK absorption edge gives an accurate description of the experimental Ar Kα intensity ratios from counters operated at different values of gas pressure. Results of all-element film analyses provided by a matrix correction procedure, ZAF, indicate an accuracy better than 5% relative for the determination of Ar concentrations ranging from 0.1 to 10 wt%.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 13 (1988), S. 20-24 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Electron probe micro-analysis is applied to the determination of thin films (20-200 nm) deposited on a known substrate. Bulk standards are used for calibration and data reduction is based on the computation of Φ(pz) depth distribution functions. The Φ(pz) model of Pouchou and Pichoir and the Gaussian Φ(pz) expression of Packwood and Brown are compared by investigating Cu and Au films on various substrates. Particular refinements, mainly by introducing an effective atomic number, are discussed in respect of double layers and a large difference between the atomic number of the film(s) and that of the substrate. Mass thickness and composition of single layers as well as double layers can be determined with an accuracy of at least 5% relative. This was estimated in comparison with chemical analysis and Rutherford backscattering spectroscopy of alloys on Si applied to magneto-optic recording.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    X-Ray Spectrometry 14 (1985), S. 84-88 
    ISSN: 0049-8246
    Keywords: Chemistry ; Analytical Chemistry and Spectroscopy
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A special electron microprobe data reduction procedure permits the determination of oxygen in vacuum-deposited metal layers independent of the surface oxide layer, the mass thickness of which is simultaneously calculated. The method combines measurements of O Kα x-rays at two values of the primary electron energy in the range 5-12.5 keV, which correspond to different depth distributions of x-ray production. The measured data are evaluated by calibration curves derived from Gaussian Φ(ρz) depth distribution functions. Test analyses have been performed on amorphous metal layers with thicknesses of 0.5-1.5 μm. Typical concentrations of incorporated oxygen found ranged from 0.1 to 5 wt-%. The influences of surface oxide films with mass thicknesses of 1-30 μg cm-2 were studied by annealing experiments in agreement with the results derived from oxygen depth profiles measured by secondary ion mass spectrometry.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
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