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  • 1
    Electronic Resource
    Electronic Resource
    Novel methods of TXRF analysis for silicon wafer surface inspection (1999)
    Springer
    Fresenius' journal of analytical chemistry 363 (1999), S. 98-102 
    Details
    ISSN: 1432-1130
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract TXRF became a standard, on-line inspection tool for controlling the cleanliness of polished Si wafers for semiconductor use. Wafer makers strive for an all-over metallic cleanliness of 〈 1010 atoms · cm–2. The all-over cleanliness can be analyzed using VPD/TXRF. For VPD preparation and scanning we have developed an automatic system coupled with TXRF. With synchrotron radiation TXRF we were able to detect 13 fg of Ni in a residual microdroplet, i.e.105 atoms · cm–2.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s002160051145
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Accurate calibration of TXRF using microdroplet samples (1996)
    Springer
    Fresenius' Zeitschrift für analytische Chemie 354 (1996), S. 266-270 
    Details
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract TXRF has been applied in combination with VPD to the analysis of trace impurities in the native oxide layer of Si wafer surfaces down to the range of 108 atoms · cm–2. Proper quantification of VPD/TXRF data requires calibration with microdroplet standard reference wafers. The precision of calibration function has been evaluated and found to allow quantification at a high level of 3 σ confidence with microdroplet standard reference.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s0021663540266
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Anodisch oxydierte Aluminiumoberfläche: Ein neues Adsorbens in der „Dünnfilm-Chromatographie“ (1972)
    Springer
    Fresenius' Zeitschrift für analytische Chemie 260 (1972), S. 203-206 
    Details
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Zusammenfassung Die Herstellung einer chromatographisch aktiven, sehr dünnen Al2O3-Schicht auf Plättchen und Drähten aus Aluminium nach einem neuartigen anodischen Oxydationsverfahren wird beschrieben. Die ausgezeichneten Trenneigenschaften der Schicht werden an Beispielen der „dünnfilm-chromatographischen“ Trennungen eines Farbstoffgemisches, von einigen Metalldithizonaten und von Metaboliten des Pflanzenschutzmittels Endosulfan im Nanogramm- und Picogramm-Bereich aufgezeigt.
    Notes: Abstract The preparation of a very thin chromatographically active Al203-layer on small aluminium plates or wires by a new anodic oxidation method is described. The excellent suitability of this Al2O3-layer for application to separations are demonstrated by the examples of “thin-film Chromatographic” separations of a mixture of dye stuffs, some metal dithizonates and metabolites of the pesticide Endosulfan in the ng and pg range.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00431497
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    Paper (German National Licenses)
    Fulltext
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