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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 3330-3336 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new model for the low frequency (LF) noise in the base current of polysilicon emitter bipolar junction transistors (BJTs) is proposed. This model is based on the carrier number fluctuation approach and satisfactorily accounts for the base current noise characteristics. The base current fluctuations are ascribed to surface and volume noise sources. The surface noise arises from the low frequency fluctuations of the surface generation–recombination base current component due to the dynamic trapping–detrapping of carriers into/from slow states located in the spacer oxide at the periphery of the emitter/base junction. The volume noise results from the intrinsic fluctuations of the diffusion base current due to the carrier number fluctuations in the emitter or at the emitter–base junction. This LF noise model has been applied to BJTs subjected to hot carrier stress after reverse biasing of the base–emitter junction. The evolution of the base current noise characteristics after stress clearly demonstrates that the hot carrier injection leads to a substantial increase of the surface base current noise component whereas the volume noise component as well as the collector current noise is nearly insensitive to the degradation-induced defects. The application of the model provides an evaluation of the slow and fast trap densities generated as a function of the stress level. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 4495-4501 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A mathematical method is proposed to calculate the temperature evolution in semiconductor layers from the measurements of Fabry–Pérot (FP) interferences in the reflected or transmitted intensity of a probing laser beam. The changes in the optical intensity are caused by the temperature induced changes in the refractive index and thermal expansion of the semiconductor layer. The method is particularly suitable in cases where the intensity curve exhibits few (at least two) FP intensity extrema. The unknown temperature evolution is obtained from a comparison of mathematical representations of the intensity–time and intensity–temperature dependences and using a symmetry property of the FP intensity–temperature function around the intensity extremum. Expressions for polynomial and exponential approximations of the temperature evolution are given together with empirical rules to maximize the accuracy of output parameters as thermal time constant, polynomial expansion coefficients, and temperature amplitudes. The applicability of the method is demonstrated by time resolved optical reflectivity measurements on semiconductor devices with the active layer forming a FP resonator: smart power devices prepared by silicon-on-insulator technology and power sensors fabricated on GaAs micromachined cantilevers. The temperature evolution in the former and latter devices is studied in the μs and ms time scale up to the temperature increase of 200 and 350 K, respectively. The relative error in both the extracted temperature evolution and time constants is about 15%. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 4049-4058 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We investigate physical mechanisms of random telegraph signal (RTS) noise in reverse base current of hot carrier-degraded polysilicon emitter bipolar junction transistors. RTS noise, analyzed in the time domain, is studied as a function of reverse base-emitter bias, temperature, and additional reverse-bias stress. Two-level RTS with a relative amplitude as high as 100% is observed at room temperature. The RTS amplitude varies exponentially with the applied reverse base-emitter voltage and depends weakly on temperature. The additional hot carrier stress is observed to induce changes in RTS amplitude and mean pulse widths (independent or correlated), and a disappearance/reappearance of the RTS fluctuations. The results are interpreted by a model where the RTS noise is caused by fluctuations of generation-recombination (g-r) parameters (i.e., capture cross sections and energy position in the gap) of a stress-induced complex bistable defect (CBD) at the Si/SiO2 interface. The complex defect is assumed to be either a two-state fast interface state or an interacting pair of a fast interface state with a slow neighboring border trap. The RTS amplitude is well explained by fluctuations in a single-defect electric-field-enhanced g-r rate between a finite value and naught. The RTS amplitude-bias characteristics and their temperature dependence are satisfactorily accounted for by an expression for a phonon-assisted tunneling current via a single deep-level state. The model parameters are the g-r parameters of the defect and its spatial position in the base-emitter p–n junction. The stress-induced changes in the RTS noise are attributed to the influence of log-time trapping of hot carriers on border states laying in the vicinity of a CBD center. The charged border traps interact with a CBD, changing both its g-r parameters and the RTS switching behavior. The variations in RTS parameters are related to the microscopic nature of the interaction and are discussed for the two types of the CBDs. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 541-543 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The random telegraph signal (RTS) with a relative amplitude of up to 100% has been observed in the forward and reverse base current in polycrystalline emitter bipolar junction transistors after hot carrier degradation. The RTS is explained by modulations in the surface generation-recombination rate due to fluctuations in the capture cross section of two-state interface centers. Carrier trapping/emission on slow oxide traps and/or defect reconfiguration are assumed to be responsible for the cross-section fluctuations © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 0169-4332
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Microelectronic Engineering 22 (1993), S. 119-122 
    ISSN: 0167-9317
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Electrical Engineering, Measurement and Control Technology
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Solid State Electronics 35 (1992), S. 1737-1743 
    ISSN: 0038-1101
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Type of Medium: Electronic Resource
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