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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 4215-4224 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A silicon oxide layer is formed at the interface of low pressure chemical vapor deposited Y2O3 film on Si after an annealing in O2 at 580 °C for 45 min. It shows a graded composition varying from SiO2 to SiOx (x∼1) which depends on the thickness of Y2O3 film as revealed by infrared and Auger electron spectroscopic studies. With 52-nm-thick Y2O3 film, a more ordered coesite-like (c-) SiO2 forms at the interface whose structure changes gradually to an amorphous (a-) SiO2, SiO2−x near the Si interface. With thicker Y2O3 film (∼110 nm) the formation of a-SiO2 is characterized by SiO4 linkage having short range order with larger size rings. The composition of silicon oxide changes gradually to SiOx with 1〈x〈2 near the Si interface. In thinner Y2O3 film (∼30 nm), in addition to c-SiO2 and a-SiO2, quasi-SiO2 with unlinked SiO4 tetrahedra are also observed. The interfacial growth of silicon oxide is due to the oxidation of Si by quasi atomic oxygen which migrates from its entrapped position in the Y2O3 film towards the Si-silicon oxide interface. This silicon oxide shows high intrinsic positive charges ∼4×1012 cm−2 and large density ∼1.0×1012 cm−2 eV−1 of interface states in comparison to thermally grown SiO2 on bare Si. According to this investigation, to use Y2O3/SiO2 bilayer dielectric as a metal-insulator-semiconductor capacitor in high density memory storage devices, the structure and composition optimization of SiO2 layer is very important.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6691-6702 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin Y2O3 dielectric films on p-Si(100) structures prepared by low-pressure chemical-vapor deposition show an interfacial growth of a thin SiO2 layer (≈2 nm). Oxygen annealing at 580 °C for 45 min causes a further growth of this oxide layer to ≈8 nm. The interfacial silicon oxide has a bilayer structure consisting of crystalline SiO2 at the Y2O3 side and suboxide SiOx at the Si side of the interface as revealed by line shapes of Auger Si transition and Fourier-transformed infrared spectroscopy studies. The as-deposited Y2O3 film/Si-based metal-insulator- semiconductor MIS structures show a single-step breakdown with a sharp breakdown field distribution, whereas the O2-annealed structures show a two-step selective breakdown with a dispersive breakdown distribution. O2-annealed Y2O3 film/Si-based MIS structures do not show the expected reduction in leakage currents. This is attributed to growth of a crystalline SiO2 layer and generation of defect and charge trapping at the Y2O3/SiO2/Si interface. The hysteresis effect observed in the C-V curves at varied ramping rates shows that the nature of traps in the as-deposited Y2O3 film/Si interface is such that the electron capture process is slower than emission, while in O2-annealed structures the reverse is true.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 7019-7021 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Direct preparation of high coercivity gamma iron oxide (γ-Fe2O3) thin films by chemical vapor pyrolysis techniques have been described. Films deposited at temperatures above 500 °C have the γ- and those deposited below 500 °C have the α-Fe2O3 phase. Gas phase reactions leading to oxygen deficiency in the vicinity of substrate and consequently controlled in situ oxidation of Fe3O4 appear responsible for direct growth of the γ-Fe2O3 film. Magnetic properties of these films are optimized by adding cobalt. High coercivity values of 3 kOe for directly deposited γ-Fe2O3 films containing 6 at. % of cobalt are obtained along with reasonable values of remanence ≈2.8 kG and squareness ratio of 0.83. These values are considerably superior for magnetic recording in comparison to those for γ-Fe2O3 films obtained by reduction and reoxidation of α-Fe2O3 films.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 953-956 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A low pressure metalo-organic chemical vapor deposition (LPMOCVD) technique to form Co2+ and Ce4+ doped yttrium iron garnet (Y3−xCexFe5−xCoxO12: Co,Ce:YIG) films is described. A large concentration of Co2+ doping with x=0.3–0.7 results in uniaxial anisotropy perpendicular to the plane of the film with high coercivity values and sufficiently high saturation magnetization values. This has been possible by an alternate doping scheme where commonly used compensator, Ge4+ at Fe3+ sites has been replaced by a new compensator Ce4+ at Y3+ sites in the Co-doped YIG films. The structural and compositional aspect of stabilized garnet phase in Co2+,Ce4+:YIG thin films and optical, thermomagnetic and magnetic hysteresis properties are presented. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5645-5653 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ellipsometric studies in the energy range 1.5–5 eV have been performed on thin films of Cd1−xMnxTe deposited by sublimation from alloys prepared by melt quenching. The spectra show E0, E1, and E1+Δ1 transitions of cubic semiconductors. The changes in peak positions under influence of HeNe laser light, small alternating magnetic field, and under the influence of both applied simultaneously have been investigated. Shifts in peak positions observed for all the three transitions have been interpreted on the basis of changes in the band structure of Cd1−xMnxTe thin films at these critical points. This has been corroborated by theoretically calculating the effective number of electrons contributing to transition per atom Neff and the density-of-states data. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 3585-3591 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Evolution of elemental binaries and single-phase copper indium diselenide, CuInSe2 (CIS) during Se vapor selenization of evaporated Cu/In bilayer metal precursors at pressures of 0.3–10 mbar and temperatures in the range of 260–400 °C has been investigated. At low pressures, the relative kinetics of selenization of Cu and In are changed resulting in the formation of single-phase CIS even at very low temperatures (260 °C). Optical, Auger, and x-ray photoelectron spectroscopy investigations are employed to characterize the chalcopyrite absorber layer. At higher pressures (≈7–10 mbar), simultaneous formation of the equilibrium binaries, CuSe and In2Se3 at low temperatures leads to the formation of CIS through a diffusion limited reaction of the binaries at higher temperatures. The availability of Se reacting species varies significantly in the pressure regime. At low reactor pressures and Se availability, the reaction CuSe+In(l)+Se→CIS, proceeds to completion even at low temperatures. The detailed study of the phase evolution is made by x-ray diffraction and scanning electron microscopy investigations and correlated with the Se availability in the reactor. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 3068-3071 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A plasma assisted two stage selenization process using elemental selenium vapor is demonstrated for the preparation of selenide semiconductor thin films. Vacuum evaporated copper films are selenized using the vapor of elemental selenium which has been ionized by a radio frequency plasma. This enhances the reaction kinetics by modifying the availability and ionization state of Sex species present in the gas phase. In contrast to the H2Se selenization, the availability of the Sex species in the gas phase is not dependent on the kinetics of its reaction with the precursor. Formation of highly crystalline CuSe films has been observed at low temperatures (250 °C) within 2–5 min. CuSe films show large (≈2–5 μm) rodlike crystallites, with a highly oriented microstructure in plasma assisted growth as different from the small (≤1 μm) coalescing grains in the polycrystalline films formed by the conventional selenization scheme. X-ray diffraction shows a threefold enhancement in the intensity of the (006) reflection of the hexagonal CuSe phase indicating the orientation of the c axis of the crystallites, normal to the plane of the film. The observed hexagonal CuSe growth phase is in agreement with the thermodynamics of copper selenium vapor reaction.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5041-5052 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Metal-insulator-semiconductor (MIS) diodes with an electron-beam-deposited and oxygen-annealed thin (≈80 nm) Y2O3 dielectric layer on p-Si(100) show metal-oxide-semiconductor capacitor action. As-deposited Y2O3 films are oxygen-deficient amorphous and show low 5×10−9 A leakage currents for a capacitor area of 0.785 mm2 and breakdown fields of 1.0 MV/cm. Amorphous Y2O3 film crystallizes to a bcc phase by annealing at 400 °C causing increased conduction due to asperities related localized high-field regions at contacts while its dielectric constant increases from a low value of 9.0ε0 to 27ε0. Annealing the Y2O3 film on Si above the crystallization temperature in the range 425 °C〈Ts 〈 650 °C leads to growth of an about 5-nm-thick intermediate SiO2 layer at the Y2O3/SiO2 interface. A remarkable two orders of magnitude decrease in leakage current to 2×10−11 A and increase in breakdown field to 2.0 MV/cm is observed for MIS diodes with composite Y2O3/SiO2 dielectric. Current-voltage behavior in the inversion mode demonstrates existence of positive charge trapping states at the Y2O3/SiO2 interface region. The current transport in Y2O3 and Y2O3/SiO2 insulator layers is dominated by bulk conduction behavior of Y2O3 through the Poole–Frenkel mechanism.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 4442-4445 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To counter the problem of instability, irreproducibility, and low stoichiometry of p-CuxS layers in thin-film CdS solar cells, a new field-assisted chemiplating process of barrier formation is described. Using the dc-forming potential as a first-order variable, nominal deviation from Cu2S composition without any dependence on external process parameters has been obtained. The stability of higher composition CuxS is attributed to the formation of a Cd++, rich barrier layer at the growing CuxS interface towards the CdS side, as inferred from the spectral response and Auger Cu and Cd compositional depth profile of the solar cells.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 78 (2001), S. 1709-1711 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Significant enhancement in the saturation magnetization Ms and coercivity Hc of yttrium iron garnet (YIG) films has been obtained by a simple method of surface infiltration of CoO. Deposition of a CoO overlayer under specific conditions by a low-pressure chemical-vapor deposition process over the crystallized YIG film has been observed to show high out-of-plane Hc and Ms values of 282.7 and 85.7 kA/m, respectively. The effect of the CoO deposition rate, temperature dependence of coercivity Hc, and annealing studies have been described that indicate CoO infiltration during the growth, resulting in a Co-rich YIG layer, and generation of interfacial stress are responsible for this unusual effect. Delineation of the interface by ion-beam etching in conjunction with magnetic studies has led to the understanding of the nature of the Co-rich YIG interfacial layer. Enhanced Hc and Ms values without the usual method of Ce4+ compensation of Co-doped YIG films described in this letter are of considerable use for application in high-density magneto-optic recording media. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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