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  • 1
    ISSN: 1063-7826
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Abstract The results of an investigation of layers of porous silicon (PS), which was obtained by electrochemical etching of p-Si under different illumination conditions — natural light, incandescent light, and light from a mercury lamp with and without a filter — are reported. The structure of the layers was studied by double-crystal x-ray diffractometry, the composition was monitored by means of the IR absorption spectra, and the radiative properties were monitored according to the photoluminescence (PL) spectra. It was established that electrochemical etching under illumination produces PS with a higher porosity and more intense PL whose maximum is shifted into the short-wavelength region. These changes are accompanied by a large disordering of the structure and an increase in the oxygen content in the layer. It is concluded that illumination accelerates the chemical interaction of PS with the electrolyte due to oxidation. High-porosity porous silicon stored in air exhibits quenching of PL. Conversely, PL is excited in layers with a lower porosity. Aging of PS is characterized by an increase in the microdeformation of the layers, a decrease in the crystallite sizes with a partial loss of coherence between the crystallites and the substrate, and an increase in the fraction of the amorphous phase.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Physics of the solid state 40 (1998), S. 1249-1251 
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract An X-ray photoelectric absorption by samples of synthetic opals (SO) loaded by In and Si has yielded filler distribution profiles over thickness. The SO+In sample exhibited a uniform filling of SO voids throughout the sample thickness (on average, 16.9% of each large void). The SO+Si sample, besides the near-surface region where large voids are completely filled, revealed a region with variable Si concentration in the SO, where the Si content decreases linearly down to a depth where pure SO is found.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Technical physics letters 23 (1997), S. 498-499 
    ISSN: 1090-6533
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract It is proposed that the filling of cluster lattices in synthetic opals can be monitored by measurements of the absorption of x-rays. It is demonstrated that the degree of filling of the pores in the opals depends on the method of incorporating In, Te, and HgSe.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1090-6533
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract Silicon is now the most important material in modern solid-state electronics. Regular systems of silicon nanoclusters containing up to 1014 cm−3 elements were obtained in a sublattice of opal (SiO2) voids. By using three-dimensional dielectric matrix-carriers similar to opal, it may be possible to obtain three-dimensional ensembles of semiconductor nanodevices. Various parameters of these “opal-silicon” nanocomposites were measured.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Physics of the solid state 39 (1997), S. 856-858 
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract A simple method is proposed for determining the porosity of fractal materials by measuring the absorption of x rays as they pass through these samples. The method makes it possible to measure the integrated porosity of objects rapidly, does not require special preparation of the objects, is not contaminating, and does not destroy their structure. The possibilities of this method are demonstrated for the examples of synthetic opals and porous silicon.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The method of two-and three-crystal x-ray diffractometry (TCD) is used for studying the dislocation structure of thick GaN layers grown by chloride gaseous-phase epitaxy (CGE) on sapphire, as well as on a thin GaN layer, which is grown by the metalloorganic synthesis (MOS) method. Five components of the microdistortion tensor 〈ɛij〉 and the sizes of the coherent scattering regions along the sample surface and along the normal to it are obtained from the measurements of diffracted intensity in the Bragg and Laue geometries. These quantities are used to analyze the type and geometry of the dislocation arrangement and to calculate the density of the main types of dislocations. The density of the vertical screw dislocations, as well as of the edge dislocations, decreases (by a factor of 1.5 to 3) during growth on a thin GaN layer. The diffraction parameters of the thick layer on the MOS-GaN substrate suggest that it has a monocrystalline structure with inclusions of microcrystalline regions.
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract Two-and three-crystal diffractometric study of the structural perfection of GaN epitaxial films grown on sapphire, GaAs, and SiC substrates is reported. The diffraction intensity distributions around the reciprocal-lattice points are shown to be extended in the direction parallel to the surface, which is connected with the anisotropy of the local strain fields in the layers. A comprehensive analysis is made of the broadening for several reflection orders measured in three geometries, namely, Bragg, symmetric Laue, and grazing-angle diffraction. The five independent components of the microdistorsion tensor δe ij , as well as the average coherent-scattering lengths in two directions, τ z and τ x , have been obtained. It is shown that for most samples the components responsible for reflection broadening along the surface are noticeably larger, i.e. δe xx 〉δe zz , and δe zx 〉δe xz , as well as τ z 〉τ x . All tensor components are related to a specific dislocation type. Electron microscopy of the samples revealed a high density of pure edge and pure screw dislocations extending normal to the interface, and which provide a dominant contribution to e xx and e zx , respectively.
    Type of Medium: Electronic Resource
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