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  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 195 (Nov. 1995), p. 203-208 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 9 (1987), S. 393-408 
    ISSN: 0392-6737
    Keywords: Electronic properties of specific thin films
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto Sono stati realizzati film dia-SiC:H mediante glow-discharge in atmosfera Ar-SiH4-CH4 con differenti rapporti CH4/SiH4. La concentrazione di H nei film è stata determinate usando la reazione di risonanza1H(15N, αγ)12C ed il contenuto di carbonio mediante spettrometria Rutherford-backscattering. Da misure di trasmittanza e riflettanza nella zona UV-visibile-vicino IR sono state ricavate le costanti ottiche, l'indice di rifrazione, la costante dielettrica, il coefficiente di assorbimento e il gap ottico. Un esame delle bande degli spettri vibrazionali dei vari legami CH, CSi e SiH ottenuti mediante misure di trasmissione nell'IR ha fornito un'interpretazione sulla struttura dei film. Sono state anche realizzate misure di conduttività di buio e di fotoconduttività sotto illuminamento di 500 W/m2. I risultati indicano che all'aumentare del contenuto di carbonio l'indice di rifrazione diminuisce sistematicamente per tutte le lunghezze d'onda, il gap ottico aumenta, la conduttività di buio diminuisce e nella configurazione strutturale tendono a prevalere le catene contenenti il carbonio.
    Abstract: Резюме Ъыли осаждены две системы пленокa-SiC:H в атмосфере Ar-SiH4-CH4, чтобы исследовать переменного отношения CH4/SiH4 на физические свойства. Состав пленок определяется с помощью резонансных ядерных реакций и измерений обратного резерфордовского рассеяния. Также определяются оптичззкся щеяь и показатель преломления с помщяю иемерений пронисаемости в видимойультрафиолетовой-близкой инфракрасной области, конфигурацуя связи с помощью измерений инфракрасной проницаемости и удельное сопротивление и фотопроводимость с помошью єлектрических измерений в темноте м при освешении 500 Bt/M2. Полученные результаты покасывают, что с увеличением содержания углерода показатель преомления систематически уменьшается для всех длин волн, єнергетическая щель увеличивается, темновое сопротивление увеличивается, конфигурация связи становится доминирующей за счет углерод-содержащих цепочек и структура становится более разориентировнной.
    Notes: Summary Two sets ofa-SiC:H films were deposited by glow discharge in an Ar-SiH4-CH4 atmosphere to investigate the effect of a variable CH4/SiH4 ratio on the physical properties. The composition of the films was determined by resonant nuclear reaction and by Rutherford backscattering measurements, the optical gap and the index of refraction by transmissivity measurements in the visible-UV-NIR range, the bonding configuration by IR transmissivity measurements and the resistivity and the photo-conductivity by electrical measurements in the dark and under a 500 W/m2 illumination. Results indicate that with increasing carbon content the refractive index decreases systematically over all wavelengths, the energy gap increases, the dark resistivity increases, the bonding configuration becomes dominated by carbon-containing chains and the structure more disordered.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 721-726 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The a-CSiSn alloy produced by rf magnetron sputtering in SiH4, CH4, and Ar atmosphere was studied as a function of the substrate temperature. The composition of the films was determined by elastic recoil detection analysis and by Rutherford backscattering measurements, and the density was then deduced. Results of a study of optical and electrical properties and of the bonding and structure of the films indicate that with the increase of the substrate temperature, the density and the imaginary part of the dielectric constant increases, the optical gap decreases, and the dark conductivity presents a different conduction mechanism depending on the substrate temperature. A correlation between the results obtained from nuclear measurements and IR spectroscopy is presented.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 611-618 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A detailed study of the optical properties of sputtered hydrogenated amorphous silicon films with varying hydrogen concentration is presented here. The energy dependence of the absorption coefficient is looked into, in detail, from a point of view of understanding the well known Tauc rule and the alternate relations being proposed in recent years. Spectroscopic and band-structural models like Wemple–Didomenico and Penn are then utilized to analyze the optical parameters near the band-gap region of the wavelength spectra. Extensive comparisons of our results are made with those of sputtered a-Si:H films of other workers, glow discharge prepared a-Si:H, chemically vapor deposited and evaporated a-Si, and also crystalline silicon. The similarities in the variation of the optical properties of a-Si:H with increasing hydrogen concentration (or decreasing measurement temperature) to that of crystalline silicon with decreasing measurement temperature lead us to interesting conclusions. Thus, it seems that decreasing disorder (topological or thermal) in a-Si:H is equivalent to decreasing thermal disorder in c-Si, at least as far as the disorder-optical property relationships are concerned.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 5424-5427 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The optical properties of undoped α-Si:H films prepared using magnetron sputtering at different deposition conditions were studied by measuring their transmittance and reflectance between λ=0.25 and λ=1.5 μm and their thickness. The extracted optical constants are interpreted to give values of the band gap. Values of dark conductivity and activation energy are also obtained. The study has been extended to structures SnO2/α-Si:H/substrate. From measurements of transmittance and reflectance of the system optical constants of the components can be extracted.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4116-4123 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of dissipated power and gas dwell time in SiH4+CH4 plasmas on the properties of a-SiC:H films deposited by plasma-enhanced chemical-vapor deposition have been investigated for different methane fractions in plasmas operating in the low-power regime. Optical, structural, and electrical characterizations have been performed in order to investigate the influence of dissipated power and molecule dwell time on the physical properties of a-SiC:H films. It was found that both the investigated deposition parameters can have a remarkable influence on carbon incorporation and on optical properties such as the energy gap. In particular an increase in the dissipated power or in the molecule dwell time leads to an increase in carbon incorporation and in energy gap. The electrical properties and defect density are still those of device quality films grown in standard deposition conditions and are not influenced by variations in dissipated power or gas dwell time. From these results some conclusions regarding the growth mechanisms are drawn. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 60 (1992), S. 1465-1467 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Amorphous hydrogenated silicon-germanium alloys a-Si1−xGex:H in the form of thin films were prepared by rf sputtering and chemical vapor deposition methods with x varying from 0 to 0.63. Optical transmission, reflection, and photoconductivity measurements in the visible and near-infrared regions of light enabled determination of the optical energy gap, band-tail states distribution, and density of defect states near midgap. Dark conductivity and photoconductivity were measured in the temperature range of 300–500 K. Electronic band structure (density of states versus energy) for a-Si0.74Ge0.26:H thin film was derived on the basis of optical measurements, dark conductivity, and photoconductivity.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 0040-6090
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 0040-6090
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Thin Solid Films 146 (1987), S. L19-L22 
    ISSN: 0040-6090
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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