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  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 264-268 (Feb. 1998), p. 9-12 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 6861-6863 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Cd1−xMnxTe films (thickness ∼0.5 μm, x=0.10–0.37) have been grown by metalorganic chemical vapor deposition on commercial GaAs and glass substrates with and without buffer layers of CdTe and CdS. Raman scattering shows the films to be of high quality, despite the large film-substrate lattice mismatch. CdTe-like and MnTe-like phonon lines are sharp and strong in first and second order with widths ≤10 cm−1, and clearly appear in combinations up to fourth order. Raman and photoluminescence analysis also establish an optimum growth temperature and limits on the fraction of Mn.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 2087-2089 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Silicon solar cell efficiencies of 16.9% have been achieved on 0.2 Ω cm float zone silicon, using a simplified cost effective rapid thermal process (RTP). Although the individual processing steps are not fully optimized yet, this represents the highest reported efficiency for solar cells processed with simultaneous front and back diffusion with no conventional high-temperature furnace steps. A diffusion temperature schedule coupled with an added short in situ slow cooling during RTP resulted in greater than 200 μm diffusion length and appropriate diffusion profiles for high efficiency cells. Plasma enhanced chemical vapor deposition (PECVD) of SiN/SiO2 was used for surface passivation and antireflection coating. Conventional cells fabricated by furnace diffusions and oxidations gave an efficiency of 18.8%. Process optimization can further reduce the gap between the conventional and RTP/PECVD cells. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 2151-2153 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Surface and interface properties of CdTe/CdS/SnO2/glass heterojunction solar cells are studied by means of x-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS), and optical reflectance (OR) techniques. First, n-type CdS layer was grown by solution growth technique on the SnO2 coated glass substrate and then the p-type CdTe was deposited on CdS by metal-organic chemical-vapor deposition. Despite many other efficiency limiting mechanisms in CdTe solar cells, this article shows that surfaces and interfaces play an important role in determining the cell efficiency. In an attempt to correlate the surface and interface properties to the cell performance, a series of CdTe/CdS solar cells with different conversion efficiencies were fabricated and analyzed. It was found that high efficiency cells possess Te-rich CdTe surface along with smooth interfaces, as revealed by XPS, SIMS, and OR measurements, while low efficiency cells display near stoichiometric or Cd-rich CdTe surface and abrupt interfaces. The impact and role of interface/surface properties on CdTe solar cell performance are discussed. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 2048-2054 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effective surface recombination velocity (Seff) at plasma enhanced chemical vapor deposited (PECVD) SiO2/Si interface as a function of surface band bending under illumination was obtained by combining the photoconductive voltage decay measurements with indium tin oxide gate bias voltage, metal-oxide-semiconductor-capacitance voltage, measurements and theoretical calculations. The capture cross sections for electrons and holes are obtained for the first time for the PECVD SiO2/Si interface state. Theoretical calculations of Seff based on the interface parameters, including interface state density and cross sections for electron and hole, were performed to see the effects of the positive oxide charge density (Qox) on Seff. It is found that roughly a 10 times larger value of Qox compared to the midgap interface state density is required to reduce Seff below 10 cm/s for 5 Ω cm (100) p-type Si. These results prove the potential of PECVD SiO2 for effective passivation of Si surfaces for devices like solar cells.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2666-2670 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Absorption coefficients for n- and p-type InP are reported for the first time in the energy range of 1.3–3.0 eV in this paper. In order to obtain absorption coefficients in the higher energy range of 1.8–3.0 eV, extremely thin (∼0.2 μm) InP samples were fabricated and bonded to glass substrates. For measurements in the lower energy range of 1.3–1.6 eV, samples with thickness in the range of 0.5–0.9 μm were found to be optimum. For energies below 1.6 eV, the absorption coefficients are a strong function of the doping concentration. However, in the energy range of 1.8–3.0 eV there is little doping dependence and the measured absorption coefficients follow the theoretical calculations. In the case of n-type samples, absorption coefficients decrease with increasing doping concentration and the absorption edge moves to higher energy due to the Burstein–Moss effect. For p-type samples, the absorption edge shifts to lower energies due to transitions between band tails. Model calculations show that the use of accurate doping-dependent absorption coefficients reported in this paper, as opposed to the commonly used absorption coefficients of undoped InP, can result in significant improvement in the predicted internal quantum efficiency and device parameters of InP solar cells. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 5554-5560 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new methodology involving the measurement and integration of photoconductivity decay (PCD) of carriers is developed to separate surface recombination velocity (S), Shockley–Read–Hall lifetime (τSRH), trap-assisted Auger (Bt), and band-to-band Auger (C) recombination coefficients in semiconductors. Conventional differentiation methodology used in the past not only suffers from the potential errors due to the differentiation of the digitized injection level versus decay time transient, N=f(t), but also from the difficulty in assessing errors in the recombination coefficients because the lifetime models or equations are used to fit the differentiated data, τeff(N), rather than the raw experimental data [N=f(t)]. In this new methodology, first a mathematical equation is derived by integration of the general lifetime expression with various recombination coefficients to express the carrier decay time as a function of injection level, t=f(N). The Levenberg–Marquardt numerical method is then used to fit this mathematical equation to the raw experimental data (N,t) for rapid and accurate assessment of τSRH, Bt, and C. Finally, the PCD lifetime measurements are performed on a few silicon samples to demonstrate the validity and advantages of the integration approach over the differentiation methodology in separating and quantifying recombination mechanisms in silicon.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 3457-3461 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Conventional and electromagnetically casted multicrystalline silicon solar cells are fabricated following different passivation schemes. Thin layers (∼100 A(ring)) of thermal dry and plasma-enhanced chemical-vapor-deposition (PECVD) SiO2 are implemented for surface oxide passivation of multicrystalline silicon solar cells and compared. It is found that growing thin layers of thermal dry oxide results in efficient surface passivation. However, for thin PECVD SiO2 layers it is necessary to perform low-temperature forming gas anneal, postdeposition, in order to observe the surface passivation effect. In addition, hydrogen plasma passivation has been optimized for achieving deep penetration of atomic hydrogen in the material ((approximately-greater-than)30 μm) and as a consequence very effective bulk passivation of multicrystalline silicon solar cells. By combining front and back thermal dry SiO2 passivation with hydrogen remote plasma treatment, a cell efficiency of 17% (independently confirmed) on 4 cm2 area and 180 μm thickness is realized without any Al gettering. On the other hand, the cell efficiencies obtained using thin layers of PECVD SiO2 are found to be very comparable to the efficiency of the cells fabricated with thermal dry SiO2 layers provided that PECVD Si3N4/SiO2 are used as a double-layer antireflection coating. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 4560-4569 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This article provides a quantitative understanding of the merits and disadvantages of various methods of analyzing the deep level transient spectroscopy (DLTS) transients and spectrums. The modulation function method is compared to the covariance method of linear predictive modeling (CMLPM) transient analysis technique, and conventional DLTS spectrum methods. It is found that for high signal to noise ratio transients (high trap concentration), the modulation function method is superior to all other methods. As the signal to noise ratio decreases, CMLPM resolves closely spaced defect levels better than any other method examined. For very low signal to noise ratios, the effects of noise can only be overcome by the inherent averaging present in the more conventional DLTS spectrum analyses. The proper choice of modulation functions is also discussed, and a modified modulation function is proposed for higher resolution of closely spaced traps. Finally, DLTS transients from an electron irradiated sample containing five traps, are analyzed by conventional DLTS spectrum methods, the modulation function method and CMLPM to experimentally support the theoretical predictions.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 4570-4575 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This article provides guidelines for accurately comparing the defect resolution capabilities of different deep level transient spectroscopy (DLTS) analysis techniques. Additionally, guidelines for choosing measurement parameters such as the proper weighting times and temperature range in order to achieve maximum energy resolution are presented. The modulation function method is compared to the correlation method of linear predictive modeling (CMLPM) transient analysis technique, and conventional DLTS spectrum methods. It is found that for extremely high signal to noise ratio transients (high trap concentration), the modulation function method is superior to all other methods. As the signal to noise ratio is reduced to a more practical range, CMLPM resolves closely spaced defect levels better than any other method examined. For very low signal to noise ratios, the effects of noise can only be overcome by the inherent averaging present in the more conventional DLTS spectrum analyses. To demonstrate the applicability of this figure of merit, a discussion of the resolution problems involved in distinguishing between simultaneously present Ti and Mo impurities in Si is also presented. Finally, CMLPM is also found to be superior to the inverse laplace transform technique.
    Type of Medium: Electronic Resource
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