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  • 1
    Electronic Resource
    Electronic Resource
    Bingley : Emerald
    Microelectronics international 19 (2002), S. 19-22 
    ISSN: 1356-5362
    Source: Emerald Fulltext Archive Database 1994-2005
    Topics: Electrical Engineering, Measurement and Control Technology
    Notes: Developments in neutron detection technology during the past three years are reviewed with special emphasis on application to safety, security, or industrial development.An investigation about the possibility of using N-channel power MOSFET (metal oxide semiconductor field effect transistor) as a high-energy neutron sensitive detector is presented here. An empirical expression for neutron fluence detection is derived from the relation between neutron fluence and the evolution of the transistor current measured in the saturation region. This expression is valid for neutron fluence in the range 5×109–1×1014?n?cm-2.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    Bingley : Emerald
    Microelectronics international 22 (2005), S. 35-37 
    ISSN: 1356-5362
    Source: Emerald Fulltext Archive Database 1994-2005
    Topics: Electrical Engineering, Measurement and Control Technology
    Notes: Purpose - The aim of this paper is to provide some specific information on the effects of DC voltage stress on the current, rise time (Tr) and fall time (Tf), at switching between on and off state of power n-MOSFET devices. Design/methodology/approach - A constant positive electrical stress voltage technique is used to study the devices in this work by giving the gate a positively bias with respect to source and a short circuit of the drain with the grounded source. Voltage stress is gradually increased by automatic 1?V step until it reaches the max tolerated value by the gate dielectric (70?V for device studied in this paper). Response of the device for electrical stress was measured for different doses (stress time). Findings - The experimental results show that the rise time increases the beginning of stress dose and then it almost stabilises with time, while fall time decreases at first and then starts to increase for higher stress time. The modification of the device switching time parameters were associated to positive oxide charge and interface state Si/SiO2 effects. Originality/value - This paper offers new information concerning a very important field in microelectronic devices where the switching speed of the components becomes a major requirement. The technique used to improve the device speed has a very low cost and a simple feasibility.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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