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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5366-5372 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Carbon deposition and hydrogen codeposition is investigated as a function of ion energy, fluence, and target temperature at normal incidence by bombardment of silicon and pyrolitic graphite substrates with mass selected CH+3 molecules. An amorphous hydrogenated carbon layer (a-C:H) is formed in a thickness range of 40–130 nm at a fluence of 3×1018/cm2. The deposition process, the re-erosion phenomenon, the hydrogen content, and the H/C ratios of the carbon films are studied between 300 and 1000 K in the ion energy range from 150 eV to 3 keV. The experimental results are compared with those of TRIDYN computer simulations and previous experimental results of carbon sputtering by atomic H+ and C+ beams in order to obtain a better understanding of the interaction between hydrocarbon ions and the carbon-based wall materials in fusion devices. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3812-3817 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The changes in surface composition of USB15—a boron doped graphite containing 15 wt.% of boron—during bombardment with D ions were determined by in situ Auger electron spectroscopy at temperatures from 300 up to 1000 K. For energies above 100 eV no strong increase of the boron surface concentration could be observed even around 800 K, i.e., at the maximum for chemical erosion of pure graphite. Chemical factor analysis of the carbon Auger peak in this energy-regime results in a much larger carbidic fraction of carbon atoms than suspected from the boron content of 15%. Thus, boron influences much more carbon atoms in their chemical reactivity with deuterium ions than is expected for the stoichiometric B4C precipitates. For ion energies below 100 eV a strong increase of boron surface concentration with decreasing ion energy at room temperature was observed. The chemical erosion of carbon in this energy regime is not suppressed by boron doping and indicates a different, surface related release process of hydrocarbon molecules. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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