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  • 1
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    BJOG 102 (1995), S. 0 
    ISSN: 1471-0528
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Medicine
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4609-4614 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A detailed study of the luminescence properties of GaN layers grown by metalorganic chemical vapor deposition on sapphire substrates with GaN/AlN double buffer layers or GaN single buffer layers was carried out with photoluminescence and cathodoluminescence (CL) spectroscopy. It was discovered that the use of the double buffer layer resulted in an improved surface morphology, but also increased the strain in the samples relative to samples grown on single GaN buffer layers. Free exciton (A exciton), neutral donor-bound exciton, and acceptor-bound exciton photoluminescence peaks were observed for GaN films grown on GaN, AlN, and GaN/AlN buffer layers. Acceptor free-to-bound luminescence was also observed and the thermal activation energy of the acceptors was measured. From these data we are able to determine the acceptor binding energy, EA, to be 231.5 meV and the donor binding energy ED to be 29.5 meV. An exciton peak, the acceptor free-to-bound luminescence, and an unidentified lower energy peak were observed with CL. CL imaging also allowed us to correlate luminescence with surface features of the films. e-beam annealing of both n-type and p-type films was investigated. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 2436-2441 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy of Dy2S3-doped As12Ge33Se55 glasses demonstrate that the broad, below-gap PLE mechanism observed previously for rare-earth emissions in Er- and Pr-doped chalcogenide glasses is a general or universal feature of rare-earth-doped chalcogenide glasses, provided the transition energies of the rare earths are in the correct energy range. The PL spectrum excited in the 815 nm Dy3+ absorption band shows the 1150, 1340, and 1700 nm sequence of Dy3+ transitions expected for Dy-doped chalcogenide glasses. The PLE spectra of the 1340 (6F11/2,6H9/2→6H15/2) and 1700 nm (6H11/2→6H15/2) Dy3+ emissions exhibit broad excitation bands from ∼500 to 1000 nm, upon which the sharp intra F-band absorptions of Dy3+ are superimposed. These broad PLE bands are characterized by an exponentially decreasing slope with decreasing energy in the spectral range below the Urbach edge which is associated with the below-gap, defect- and impurity-induced exponential tails observed in the below-gap absorption spectra of chalcogenide glasses. At high energy, the exponentially rising Urbach absorption edge of the host glass, which leads to competing nonradiative decay mechanisms, eventually dominates the absorption spectrum and imposes an exponentially decreasing slope on the PLE spectra. These features of the broadband PLE have been observed in the PLE spectra of the Er-, Pr- and Dy-doped chalcogenide glasses we have studied. There is a difference in the relative strengths of the broad PLE bands, with the broadband for the 1340 nm PL band being a factor of 3 stronger than that for the 1700 nm PL emission. In addition, there is a shift in the peak energy of the different PLE spectra. Qualitatively speaking, the higher the energy of the luminescence transition, the higher the energy of the corresponding broad PLE peak. Proposed mechanisms for the broadband PLE of rare-earth emissions in chalcogenide glasses are discussed in the context of models for the below-gap, defect- and impurity-induced exponential absorption tails, including the possible role of lattice relaxation associated with charge transfer transitions and the involvement of transition metal impurities. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3365-3371 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy carried out on bulk samples of Er:As2S3 glasses demonstrate that Er3+ is incorporated in optically active sites in the glass and gives rise to a broad ∼1500–1600 nm, 4I13/2→4I15/2 emission spectrum similar to those observed in Er-doped oxide glasses. In addition to the expected 980 nm (4I15/2→4I11/2) Er3+ PLE band, the 1500–1600 nm Er3+ PL band in the glass exhibits a remarkably broad PLE spectrum which extends from the As2S3 Urbach absorption edge at ∼550 nm to beyond 1000 nm. This broad PLE band corresponds closely to an exponential PLE band observed in the "band tail'' spectral range for Er-doped Ge33As12Se55 glasses. These unusual PLE spectra indicate that in Er-doped chalcogenide glasses there is an additional broad-band, below gap, extrinsic absorption mechanism which efficiently excites the characteristic 1550 nm, 4I13/2→4I15/2 Er3+ emission band. It is not possible to determine at present whether the Er dopants themselves are responsible for the broad band absorption which excites the Er3+ PL bands, or if photoexcited carriers attributable to absorption by other impurities transfer their energy to the excited states of the Er3+ 4f shells. Microscopic characterization techniques reveal that the Er2S3-doped glasses also contain residual Er2S3 crystallites which give rise to sharp, narrow line 1550, 980, and 810 nm Er3+ optical spectra characteristic of polycrystalline Er2S3. The temperature dependence of the Er2S3 PL and PLE spectra enables the energy levels of the 4I13/2 excited state and 4I15/2 ground state manifolds to be determined. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of the American Chemical Society 70 (1948), S. 582-587 
    ISSN: 1520-5126
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 89 (1988), S. 2763-2767 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: An electric dipole moment function (EDMF) for OH has been derived by combining airglow and laboratory intensity measurements with recent high precision measurements of the dipole moments for v=0,1, and 2. This empirical EDMF shows remarkable agreement with the a priori MCSCF(7)-SCEP EDMF. However, it differs sufficiently to produce transition probabilities which are in much better agreement with observations than previously available sets.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 1795-1804 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Amorphous Si and Ge layers, produced by noble gas (Ar or Xe) implantation of single crystal substrates, have been crystallized in a differential scanning calorimeter (DSC). The MeV implantation energies resulted in amorphous layers of micron thickness whose areal densities were determined using the Rutherford backscattering and channeling of 1-MeV protons. These techniques allow determination of the amorphous-crystal interface velocity (which is proportional to the rate of heat evolution ΔH(overdot)ac) and the total enthalpy of crystallization ΔHac. Amorphous Ge was found to relax continuously to an amorphous state of lower free energy, with a total enthalpy of relaxation of 6.0 kJ/mol before the onset of rapid crystallization. The interface velocity for crystallization on (100) substrates, was found to have an Arrhenius form with an activation energy of 2.17 eV. The value of ΔHac was found to be 11.6±0.7 kJ/mol, the same as for samples prepared by deposition. For Si, ΔHac was determined to be 11.9±0.7 kJ/mol without any evidence of heat release due to relaxation. The (100) interface velocity was found to have an activation energy of 2.24 eV. The effects of the implant depth profile on the regrowth velocity could also be observed directly in the DSC signal. From the value of ΔHac and Gibbs free-energy calculations, the melting temperature of amorphous Si has been determined to be Tal =1420 K.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 56 (1990), S. 137-139 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the effect of pressure on the solid phase epitaxial growth rate of Ge(100) into self-implanted amorphous Ge by using in situ time-resolved infrared interferometry in a high-temperature, high-pressure diamond anvil cell. In the temperature range 300–365 °C, a rate enhancement of more than a factor of 100 over that at ambient pressure has been observed due to hydrostatic pressures of up to 5.2 GPa (52 kbar). The pressure enhancement is characterized by a negative activation volume of −6.2±0.6 cm3/mol (−45% of the atomic volume), which is of the same sign but greater in magnitude than we found in Si. We conclude that the defects controlling the solid phase epitaxy of Ge cannot be vacancies in the crystal, that mechanisms based on other point defects migrating to the interface from either phase are unlikely, and that mechanisms based on point defects residing in the interface are plausible.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 179-181 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A modified solid-state precipitation process for the formation of stoichiometric A-15 V3Ga is presented which results in high values of Tc=15.0 K and Hc2(4.2)=22 T, excellent phase homogeneity, and a high critical current Jc(4.2 K)=3×105–6×104 A/cm2 over the field range 0–18 T. We find that grain boundary pinning is dominant, producing a very high specific pinning force Qmax=6.4×104 dyn/cm2. The nonparamagnetically limited Hc2 is needed to explain our high flux-pinning results.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 2583-2585 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the pressure dependence of the solid phase epitaxial growth rate of self-implanted Si (100) by using the in situ time-resolved interferometric technique in a high-temperature and high-pressure diamond anvil cell. With fluid argon as the pressure transmission medium, a clean and perfectly hydrostatic pressure environment is achieved around the sample. The external heating geometry employed provides a uniform temperature across the sample. At temperatures in the range of 530–550 °C and pressures up to 3.2 GPa (32 kbar), the growth rate is enhanced by up to a factor of 5 over that at 1 atmosphere pressure. The results are characterized by a negative activation volume of approximately −3.3 cm3/mole (−28% of the atomic volume). These results show a significantly weaker pressure dependence than does the previous work of Nygren et al. [Appl. Phys. Lett. 47, 232 (1985)], who found an activation volume of −8.7 cm3/mole. The implication of this measurement for the nature of the defects responsible for crystal growth is discussed.
    Type of Medium: Electronic Resource
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