ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Presented is a method for growing crystalline diamond films by plasma enhanced chemical vapor deposition without the need for seeding with diamond particles. Instead, diamond nucleation and growth is "catalyzed'' by a thin metal film which has been either abraded or deposited onto a SiC coated substrate. In the first experiment Fe, Cu, Ti, Nb, Mo, and Ni were abraded onto a SiC surface resulting in varying degrees of diamond nucleation and growth. In the second experiment, Fe films with thickness varying from 5 to 80 A(ring) were evaporated onto the SiC. Although the 5 A(ring) Fe film did not influence the initial nucleation and growth rate, greater thicknesses did. Preliminary studies of Fe on Si have not shown this effect.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.106826
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