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  • 1
    Electronic Resource
    Electronic Resource
    Quantitative analysis by XPS using the multiline approach (1994)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 21 (1994), S. 724-730 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: An efficient method for quantitative XPS analysis is the so-called multiline approach. This method does not require standards, it takes into account the instrumental and matrix effects and it derives quantitative information from statistical analysis of all photoelectron intensities visible in the spectra. One can expect the reliability of this approach to be better than the reliability of methods involving uncorrected relative sensitivity factors. This paper summarizes recent improvements in the multiline approach. In particular, a new expression for the universal energy dependence of the inelastic mean free path is currently used. Furthermore, the statistical analysis has been modified in order to account properly for the error in the countrates. Finally, a database with physical constants has been added (photoionization cross-sections, asymmetry parameters, binding energies, etc.) to avoid errors of polynomial approximations. The modified algorithm of the multiline approach was applied to photoelectron intensities measured for AuCu alloys in four laboratories. Surfaces of these alloys were sputtered with 2 keV Ar+ ions, because at this energy the selective sputtering effects are expected to be negliible. Very consistent results were obtained. The average deviation from the bulk surface composition was found to be equal to ±3.2 at.%. Extensive software implementing the described version of the multiline approach is presently being developed.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740211008
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  • 2
    Electronic Resource
    Electronic Resource
    Surface chlorination of polypropylene film by CHCI3 plasma (1994)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 51 (1994), S. 2131-2137 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Polypropylene films were treated with the CHCI3 plasma, and their chemical composition was analyzed with XPS and ART IR spectroscopy. The CHCI3 plasma irradiation made polypropylene films hydrophilic. The advancing contact angle decreases from 95° for the untreated to about 73° for the CHCI3 plasma-treated films. In the CHCI3 plasma irradiation, the chlorination occurs, and C—Cl, C—Cl2, and C—Cl3 units are formed in the polypropylene films. Simultaneously with the chlorination, unsaturated units (C=C and conjugated C=C units) are formed from dehydrogen chlorination of the chlorinated products, but the oxygen incorporation into the films is low. The CHCI3 plasma is preferred in chlorination of polypropylene films to the CCl4 plasma. © 1994 John Wiley & Sons, Inc.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1994.070511304
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    Paper (German National Licenses)
    Fulltext
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