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  • 1
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of medicinal chemistry 32 (1989), S. 1977-1981 
    ISSN: 1520-4804
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 210-212 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Deep-level transient spectroscopy has been carried out using Schottky diodes fabricated on n-In0.53Ga0.47As grown by liquid phase epitaxy (LPE). A defect level corresponding to oxygen having an activation energy Ec−0.32 eV and capture cross section 7×10−17 cm2 was observed. Depth profiling of shallow donors and oxygen showed that concentrations of both these impurities increased towards the surface of the epilayers. Dy gettering during LPE growth significantly reduced the oxygen concentration and also resulted in lower etch-pit density. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 1940-1940 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have used Gaussian shape of individual phonon replicas for fitting the experimental curve as suggested by Collan and Krustok. Better fit has been obtained using the parameters E0 (zero phonon energy)=1.28 eV, Eph (phonon energy)=0.038 eV, δ (phonon broadening parameter)=0.026 eV and S (Hwang–Rhys factor)=2.13. Thus, the results of Pal and Bose remain unchanged. Fitting parameters used by Collan and Krustok have no physical significance. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5206-5208 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence (PL) measurements carried out between 10 and 140 K on Cu-diffused InP showed the presence of the Cu band at 1.216 eV. From the temperature variation of PL intensity the activation energy for the quenching was found to be 77.4 meV. The line shape, linewidth, and configuration coordinate diagram of the defect band have been calculated. The vibration energy of the excited state was found to be 14 meV from linewidth analysis. A coupled phonon energy of 38 meV and a Huang–Rhys factor of 2.13 were obtained from line-shape analysis. The displacement of the excited state minimum from the ground state was found to be 0.079 A(ring) which showed that the lattice relaxation of the Cu-related defect in InP is small. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 2148-2157 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Recently it has been recognized that the neutral gas in inductively coupled plasma reactors heats up significantly during processing. The resulting gas density variations across the reactor affect reaction rates, radical densities, plasma characteristics, and uniformity within the reactor. A self-consistent model that couples the plasma generation and transport to the gas flow and heating has been developed and used to study CF4 discharges. A Langmuir probe has been used to measure radial profiles of electron density and temperature. The model predictions agree well with the experimental results. As a result of these comparisons along with the poorer performance of the model without the gas–plasma coupling, the importance of gas heating in plasma processing has been verified. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 2931-2935 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Detailed studies on metal-(111) p-ZnTe Schottky barriers have been carried out using In, Ag, Al, and Cu as barrier metals. Weak dependence of barrier height on metal work function was observed. The highest and lowest barrier heights of 0.99 and 0.80 eV were found for In and Cu respectively which had lowest and highest work functions. The ideality factor n was found to vary between 1.84 for In and 2.13 for Al contacts. The Fermi level was found to be pinned effectively by interface states, the density of which was calculated to be 4.7×1013 states/cm2/eV. From the current–voltage characteristics measured between 250 and 350 K, the effective Richardson constant A** was determined to be 72±6 A/cm2/K2. This agrees very well with the theoretically calculated value of A** for a hole effective mass mh*=0.6m0. The temperature variation of barrier height was also determined from the capacitance–voltage characteristics. The interface index a parameter used to describe the pinning strength of semiconductors was found to be 0.34 for ZnTe. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 6599-6601 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Minority carrier lifetime in ZnTe has been determined from steady-state and time-resolved photoconductivity (PC) measurements. Three types of single crystal p-ZnTe (EG=2.26 eV) grown by the Bridgman technique were studied: (i) as-grown, before and after hydrogen passivation, (ii) Zn annealed, and (iii) In-doped semi-insulating. Steady-state photoconductivity was studied between 80 and 300 K and showed that for as-grown samples, the lifetime went through a sharp maximum of 4.5×10−7 s at 220 K, decreasing to 2.5×10−8 s at 300 K. For hydrogen passivated samples, the low temperature behavior was similar but the lifetime remained high at 4.5×10−7 s at 300 K, due to passivation of deep acceptors OTe. Time-resolved photoconductivity measurements gave a value of 4.6×10−8 s for as-grown ZnTe in reasonably good agreement and 3.2×10−7 s for Zn annealed and 3.1×10−7 s for SI-ZnTe. The radiative recombination constant B was thus found to be 1.4×10−9 and 4×10−10 cm3 s−1, respectively, at 300 K for as-grown and Zn-annealed samples. PC spectral response studies showed a maximum at 2.41 eV at 300 K corresponding to the main valence–conduction band transition as well as a feature near 3.2 eV corresponding to the splitoff band. Slight shift in peak energy to 2.43 eV occurred on H surface passivation due to reduction of surface recombination velocity. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 7387-7391 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Chemical treatment is a very effective method for passivation of semiconductor surfaces. HF and sulfide (Na2S⋅9H2O) pretreatments of InP have been shown to improve the properties of BaF2/InP interface significantly. The interface state density as obtained from C–V (1 MHz) measurements of metal-insulator–semiconductor structures was found to be reduced from 5.8×1010 cm−2 eV−1 to 2.1×1010 cm−2 eV−1 after HF treatment. The reduced interface state density resulted in increased photoluminescence intensity. X-ray photoelectron spectroscopy studies revealed that the formation of InF3 and P2S3 after HF and sulfide treatments, respectively, are responsible for better interfacial behavior.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 3744-3749 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper describes the characteristics of thin fluoride films on InP which are used as dielectric for metal-insulator-semiconductor (MIS) devices. Films of Ba1−xSrxF2 (x=0.0, 0.5, 0.83, and 1.0) were deposited by sublimation of mixtures of BaF2 and SrF2 in vacuum under 10−5 Torr pressure. The composition of the films was deduced from x-ray diffraction and energy dispersion analysis by x-ray studies. The electrical activation energies of the films determined between 120 and 300 K were found to be 3.5–22.0×10−3 eV , depending on composition and temperature. The resistivity of the films was in the range of 5.0×1011 to 5.0×1012 Ω cm with the breakdown fields greater than 5.0×105 V cm−1 . The interface state density obtained was as low as 5×1010 cm−2 eV−1 with annealed BaF2 films. Scanning electron microscope studies showed that annealing caused development of cracks resulting in decreased film resistivity. Auger studies gave evidence of broadening of the interface and outdiffusion from the substrate due to annealing.
    Type of Medium: Electronic Resource
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