ISSN:
1573-5036
Keywords:
Endomycorrhizae
;
Fumigation
;
Methyl bromide
;
Mycorrhizal dependency
;
Phosphorus
;
VAM
Source:
Springer Online Journal Archives 1860-2000
Topics:
Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
Notes:
Summary The growth of twenty plant species was compared under field conditions in a methyl bromide fumigated and non-fumigated soil. The non-fumigated soil had a wild endomycorrhizal flora and contained 100 μg/g of available phosphorus. No phosphorus was added to the soil but both fumigated and non-fumigated plots received a basal fertilization of 100 kg/ha N−NH4NO3 and 100 kg/ha K−KCl. Based on plant growth responses, three groups of plants were distinguishable. Plants from group I were mycorrhizal and had better growth in non-fumigated than in the fumigated soil. This group was the most important, including sixteen plant species. Stunting of plants from group I following soil fumigation was mainly attribuable to the destruction of mycorrhizae. Plants from group II (oat and wheat) grew equally well in non-fumigated and fumigated soils. For these plants which were mycorrhizal in the non-fumigated plots, the P-content of the soil was sufficient for growth and therefore no stunting was observed in the absence of mycorrhizae. Plants from group III (cabbage and garden beet) grew better in fumigated than in non-fumigated soil. Their better growth in fumigated soil was tentatively attributed to the destruction of soil-borne pathogens. They did not form mycorrhizae in non-fumigated soil. A new method of calculating mycorrhizal dependency is proposed, and the value calculated was named relative field mycorrhizal dependency (RFMD) index. It is also proposed that the acronym RFMD receive a superscript representing in μg/g the quantity of available P in the soil. Carrot with its characteristic root systems had the highest RFMD100 index (99.2%), but other plants with high phosphorus requirements for normal growth had a wide range of RFMD100 index values.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF02374780
