Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
76 (2000), S. 3194-3196
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Spectroscopic ellipsometry is applied to determine the oxidation resistance of TiN and CrN coatings. This technique proves to provide accurate measurements of the oxide layer thickness in a convenient, fast, and nondestructive manner. The magnetron-sputtered thin films were heated in air in the temperature range between 673 and 925 K. The verification with scanning electron microscopy and x-ray reflectometry shows an excellent agreement between these complementary techniques. The rate constant k of the oxidation is directly related to the film morphology in TiN thin films. While understoichiometric films with a dense fine-grained structure exhibit a moderate k of 4 nm2/s at 773 K, overstoichiometric films with a pronounced columnar structure oxidized over seven times faster. The nonstoichiometry in TiNy and CrNy leads to a reduced activation energy for oxidation compared to stoichiometric compounds. © 2000 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.126626
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