Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
85 (1999), S. 4934-4936
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Ni–Fe/FeMn bilayers were deposited by using dual ion beam sputtering apparatus. In order to promote (111) orientation in γ-FeMn layers and to exhibit exchange bias field Hex, Si and/or silicon nitride (Si3N4) layers were deposited as buffer layers. Although silicon nitride (Si3N4) buffer layers did not improve (111) orientation in FeMn layers, as well as in Ni–Fe layers, an amorphous Si buffer layer only 1 nm thick improved (111) orientation in FeMn layers and increased Hex to above 100 Oe. FeMn/Ni–Fe bilayers deposited on Si(0.5 nm)/Si3N4(1 nm) bilayered buffer layer also exhibited high Hex of about 130 Oe. This result implies that the ultrathin a-Si buffer layer was effective in improving (111) orientation in Ni–Fe layers. Very thin Si/Si3N4 bilayers may be applicable as dielectric layers in tunneling magnetoresistive spin valve devices. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.370050
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