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Redistribution of Fe and Ti implanted into InP (1991)

Ullrich, H. ; Knecht, A. ; Bimberg, D. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 70 (1991), S. 2604-2609

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The redistribution of Fe and Ti implanted into InP and its recrystallization is studied using 〈m1;37.6p〉various thermal annealing techniques. Fe and Ti profiles are measured by secondary-ion mass spectroscopy and recrystallization by Rutherford backscattering channeling. Ti shows absolutely superior thermal stability under any circumstances as compared to Fe. Iron always accumulates at the surface and at a depth of approximately twice the projected range Rp. After high-dose implantation Fe additionally accumulates in the 0.8Rp region. At similar doses Ti still shows no diffusion and only faint accumulation between the surface and Rp.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.349370

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