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  • 81.40.Rs  (1)
  • surface cleaning  (1)
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  • 1
    ISSN: 1432-0630
    Keywords: 81.40.Rs ; 61.80.−X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract We investigated defect production in n-type GaAs with two different free-carrier densities (4×1014 and 1×1016/cm3) by using particles liberated from radionuclides. 90Sr and 241Am were employed as beta and alpha sources, respectively. The results obtained for electron irradiation showed that the same set of primary defects can be produced by beta irradiation from the Sr source as by electrons produced in an accelerator. Similarly, the defects produced by alpha irradiation from the Am source closely resemble those introduced by alpha irradiation in a Van de Graaff accelerator. It was found that the relative concentrations of the primary defects in electron-irradiated GaAs are different to those in alpha-particle irradiated GaAs. Further, for the first time, an alpha irradiation induced defect which seems to be related to the doping concentration was observed in the 1016/cm3 Si doped GaAs. It is concluded that the use of radionuclides is an inexpensive and convenient method to introduce and to study radiation induced defects in semiconductors.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 0142-2421
    Keywords: AFM ; Schottky diode ; surface cleaning ; Si(111) ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Samples of epitaxially-grown Si(111) doped to 5×1015 P cm-3 were chemically cleaned using various procedures. The surface morphologies and remaining particulate contamination of the samples were investigated using atomic force microscopy (AFM) and the electrical properties of Pd Schottky barrier diodes fabricated on the chemically cleaned surfaces were extracted from current-voltage (I-V) and capacitance-voltage (C-V) measurements. The root-mean-square roughness of the cleaned surfaces varied between 1±0.5 and 16±10 Å. The Schottky diodes had ideality factors (n) of 1.02-1.17, currents at a reverse bias of 1 V (IR) between 4×10-8 and 84×10-8 A and I-V barrier heights (φbIV) in the range 0.73-0.76 eV. Diodes fabricated on the roughest surfaces had the poorest rectifying properties. The free carrier concentration (ND) was overestimated by ∽40% when the surface roughness exceeded 10 Å. Compared to using a buffered HF solution (NH4F-HF, 6:1), native oxide removal with a diluted HF solution (H2O-HF, 49:1) resulted in rougher surfaces. © 1998 John Wiley & Sons, Ltd.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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