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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 4313-4320 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Interstitial oxygen profile across an epitaxial silicon and Czochralski silicon interface has been studied using high-spatial-resolution Fourier transform infrared spectroscopy. Systematic transmission measurements performed on a transversal wafer cross section evidenced oxygen contamination of the epilayer. This was due to solid-state outdiffusion from the substrate occurring during epilayer deposition. Oxygen diffusivity values resulting from the experiments suggest a mechanism scarcely influenced by the interface. Oxygen contamination is strictly related to the type of dopant present in the substrate and not to that present in the epilayer. The oxygen contamination of the epilayer (significant in n-type substrate samples) could explain the structural defects often observed in epitaxial layers by different techniques.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 7251-7255 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Oxygen precipitation in the bulk of silicon wafers was investigated by using micro-Fourier transform infrared spectroscopy. It was found that even at 1100 °C annealing (in single step) SiO2 precipitates are formed in platelet shape, in the bulk, giving rise to characteristic absorption peak in the infrared spectrum at 1230 cm−1. Complete mapping of wafer cross section demonstrated that these precipitates are not distributed homogeneously but are agglomerated in irregularly shaped clusters and are easily detectable up to distance of about 100 μm from the back surface and from the epi-substrate interface.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 1655-1660 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Systematic infrared transmission measurements have been performed on heavily Sb-doped (up to 2×1018 atoms/cm3) silicon samples. The interstitial oxygen content is obtained analyzing the optical response near the 1107-cm−1 oxygen absorption band with a new technique based on a curved baseline, accounting for free-carrier absorption. The results are discussed and compared with those obtained for the same samples by a short baseline technique and by secondary-ion mass spectroscopy (SIMS) analysis. Regression straight-line fits, relative to two lots of 16 samples each, show a good linear correlation between infrared (IR) and SIMS data, although the IR estimates are consistently lower than those obtained by SIMS.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 4706-4708 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spectroscopic ellipsometry (SE) from 0.8 to 5 eV and photoreflectance (PR) from 0.7 to 1.5 eV were used to study the interband optical response at room temperature of epitaxial GaAs1−xSbx layers with 0〈x〈0.5. The samples were grown by molecular-beam epitaxy at 520 °C on (001)-GaAs substrates and characterized by low-temperature photoluminescence and x-ray diffraction. The complex dielectric function ε˜(ω) of GaAs1−xSbx vs x was derived from the ellipsometric spectra after mathematically removing the oxide overlayer effects. The SE and PR spectra were analyzed with their energy derivatives in terms of standard analytical line shapes: in particular the E0, E1, E1+Δ1. E0′, and E2 critical point energies were derived as a function of x. On this basis the energy-shift model is appropriate to interpolate ε˜x(ω) for any x〈0.5, thus allowing a nondestructive optical diagnostic of epitaxial heterostructures based on GaAs1−xSbx. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1032-1039 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report experimental results obtained by means of the Brewster angle technique on samples constituted by Pb and Sn nanoparticles embedded in an amorphous SiO matrix. The extended comparison with different effective medium models gives clear indications on (i) the structural composition of the samples and (ii) the spatial distribution of the metallic particles in these systems, pointing to a quasi-two-dimensional arrangement. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 6745-6751 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoreflectance (PR) at different temperatures and spectroellipsometry (SE) at room temperature were used to study, in a systematic and complementary way, the optical response of a series of strained and relaxed InxGa1−xAs (x〈0.15) epilayers. All the samples were grown by molecular-beam epitaxy on GaAs, both with and without a GaAs cap layer, which in the thinnest samples determines a single-quantum-well configuration. The effects of the strain on the optical structures E0, E1, and E1+Δ1 observed in the 1.2–3.3 eV photon-energy range were analyzed by fitting standard critical points (CP) line shapes to the PR and SE spectra. The CP experimental energies versus x were compared with the relations obtained in the framework of the elastic strain theory and, in the quantum-well structures, of the envelope-function scheme. The excellent agreement between experiment and theory allowed us to determine, independently and only by optical techniques, the strain ε and the composition x values, which compare well with those measured by x-ray diffraction. Additional information concerning the critical thickness for the pseudomorphic growth and the residual strain in quasirelaxed layers was achieved. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 370-372 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The oxygen content near epitaxial layer-substrate silicon interface was investigated using a micro Fourier transform infrared technique. Systematic measurements, performed in a transversal wafer cross-section configuration, clearly indicated the presence of interstitial oxygen in the epitaxial layer when it was grown on n-type substrates, while no evidence of oxygen in it was obtained (in concentration detectable by the infrared technique) when grown on p-type substrates. Interstitial oxygen profiles, near the epitaxial layer-substrate interface, obtained by analyzing the optical data, are reported and discussed considering different combinations of dopants in the substrate and in the epilayer.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2657-2659 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Oxygen redistribution near the interface between the epitaxial layer and substrate was monitored with micro-Fourier transform infrared measurements in a transversal wafer cross-section configuration. It has been shown that oxygen contamination of the epitaxial layer may induce the formation of SiO2 precipitates into the film, due to outdiffusion from the substrate. To our knowledge this is the first direct evidence of oxygen precipitation phenomena within the epitaxial layer.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2099-2101 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Oxygen content in the bulk of Czochralski silicon was analyzed by using micro-Fourier transform infrared spectroscopy in a transversal wafer cross-section configuration. This technique locally distinguishes between interstitial oxygen and oxygen precipitates in wafers used as substrates for epitaxial layer growth. Systematic measurements performed in the 5000–700 cm−1 wavenumber range clearly indicate the presence of oxygen microprecipitates in the bulk of the processed silicon wafers. Quantitative determination of oxygen precipitate density is reported and compared with the measured interstitial oxygen concentration.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 1511-1513 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Oxygen solid-state outdiffusion from the substrate to the epitaxial layer was investigated by using micro-Fourier transform infrared measurements in a transversal wafer cross-section configuration. Interstitial oxygen concentration, obtained by analyzing the 1107 cm−1absorption band, indicated that an oxygen content, clearly detectable by the infrared technique, is present in the epitaxial layer near the interface. To our knowledge this is the first evidence of oxygen outdiffusion from the substrate into the epitaxial layer.
    Type of Medium: Electronic Resource
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