Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
52 (1988), S. 1089-1091
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Double heterostructure bipolar transistors with the base region consisting of a p-Ge0.5Si0.5 strained-layer superlattice have been grown by molecular beam epitaxy. At a wavelength of 1.3 μm, optical gain as high as 52 has been achieved in two-terminal phototransistors. The large photocurrent is inferred to be a product of the transistor gain, on the order of 20, and avalanche multiplication. A differential current gain of 10 has been obtained in the three-terminal bipolar transistors. The incorporation of a narrow band-gap GexSi1−x superlattice base is expected to result in higher emitter injection efficiency as compared to Si bipolar transistors.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.99220
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