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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 5109-5119 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Zinc selenide layers grown by molecular beam epitaxy (MBE) and doped with ZnO have been characterized using low temperature photoluminescence (PL) measurements as a function of excitation level, temperature, and laser energy (i.e., selectively excited donor-acceptor pair luminescence or SPL), as well as reflectance measurements. An O-related donor-to-acceptor (D0−A0) pair band is clearly observed in all of the ZnO-doped layers, whose position varies from 2.7196 to 2.7304 eV, depending on the excitation level. The same peak occurs in a number of undoped, As-doped, and Ga-doped MBE samples, showing that O can occur as a residual impurity. Temperature-dependent measurements reveal the existence of a corresponding conduction band-to-acceptor (e−A0) peak at 2.7372 eV (39.8 K), confirming the existence of the acceptor level. The binding energy of this acceptor is about 84±2 meV, which is 27 meV shallower than that of N. The SPL measurements reveal four excited states of the shallow acceptor level, separated from the 1s3/2 ground state by 48.2 (2p3/2), 57.1 (2s3/2), 64.3 (2p5/2:Γ7), and 67.7 meV (3p3/2:Γ8), respectively (all values ±1 meV). These energies fit well to conventional effective mass theory, which demonstrates that this O-related acceptor level is effective-mass-like. However, luminescence and secondary ion mass spectrometry show that the ZnO doping technique introduces shallow donor impurities into the material in addition to O acceptors, specifically high levels of chemical contaminants (mainly B and Ga) originating from the doping source. This effect may account for the lack of reproducibility in obtaining p-type conduction with ZnO doping, and suggests that more effective O incorporation methods should be devised. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 1188-1190 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The optical properties of n-type GaN grown by hydride vapor phase epitaxy, with intentional Si doping levels ranging from nominally undoped to ND−NA=4×1017 cm−3, are investigated using low temperature photoluminescence. We identify free and neutral donor-bound exciton transitions and two-electron satellites (TES) at 1.7 K. The energy difference between the principal neutral donor-bound exciton peak and its TES yields a Si donor binding energy of 22 meV. The intensity of the Si-related TES increases with increasing Si concentration. The Si donor is much shallower than the two residual donors, which have binding energies of 28 and 34 meV. This result suggests that the main residual donors in this material (and possibly in many layers grown by metal organic chemical vapor deposition and metal organic molecular beam epitaxy as well) are not Si. Silicon doping also introduces an acceptor level with a binding energy of about 224 meV. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 555-557 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We compare the nature of the band bending under GaAs surfaces prepared by alkaline sulfides [Na2S⋅9H2O, (NH4)2S] with that under oxidized GaAs surfaces. We make the point that Fermi level pinning implies band bending, but band bending does not necessarily imply "pinning.'' In either case, even weak light illumination substantially flattens the bands. On ammonium sulfide treated surfaces the fixed and trapped charge density in the dark is only ∼5×1011 electrons/cm2, but these few states are mostly neutralized at low-level forward injection. This behavior should not be confused with Fermi level pinning.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 2065-2067 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new approach to doping in ZnSe, which involves Ga deposition in spatially separated atomic planes (planar doping), is reported. The dependence of doping efficiency on the particular surface termination (Zn or Se stabilized) maintained during the deposition of the Ga dopant is investigated by Hall measurements and low-temperature photoluminescence spectroscopy, and the results are compared to those obtained for uniform doping. Under our growth conditions and for the same average amount of Ga atoms arriving at the ZnSe surface, the doping efficiency is dramatically enhanced in the case of Ga planar doping on Zn terminated surfaces. This enhancement correlates with the reduction of the broad deep luminescence bands that dominate under the other doping conditions, indicating an effective reduction of the self-compensating mechanisms. Under optimized conditions, n-type ZnSe with carrier concentration in the 1018 cm−3 range is achieved.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 2217-2219 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present low-temperature ZnSe photoluminescence spectra having very narrow bound exciton linewidths (0.55 meV), which demonstrate for the first time that thin, pseudomorphic ZnSe layers with minimal inhomogeneous strain can be grown directly on GaAs by molecular beam epitaxy. Similar characterization of ZnSe/AlAs/GaAs heterostructures shows that AlAs layers up to 4 μm thick exhibit only kinetically limited, partial lattice relaxation, which prevents the overgrowth of uniform, coherently strained ZnSe layers. However, pseudomorphic ZnSe/AlAs/GaAs structures with thin ((approximately-less-than)0.5 μm) AlAs layers exhibit the narrowest bound exciton peaks ((approximately-less-than)0.37 meV full width at half maximum) ever reported for heteroepitaxial ZnSe, indicating a high degree of structural perfection.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1242-1244 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The GaAs-on-InP heteroepitaxial waveguides are demonstrated for the first time using molecular beam epitaxy. A propagation loss of 9.3 dB/cm was obtained for waveguides grown on a 3° off (100) InP substrate. Compared to the 16 dB/cm loss for waveguides on (100) InP substrates, the waveguides on misoriented InP substrates exhibited a significantly lower loss. Based on photoluminescence studies, we attribute the propagation loss in both samples mainly to optical absorption by crystal defects. Defect densities of 4×1017 cm−3 and 2×1017 cm−3 are estimated for material on (100) and 3° off (100) substrates, respectively. Such heteroepitaxial waveguides may have applications in long-wavelength photonic integrated circuits.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 52 (1988), S. 990-992 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the first observation of highly resolved photoluminescence and excitation spectra in GaAs/AlGaAs superlattices grown by organometallic chemical vapor deposition. Luminescence linewidths as narrow as 0.5 meV, and negligible Stokes shifts between luminescence and excitation peaks are measured for samples with 80–280 A(ring) GaAs wells and 20 A(ring) Al0.3Ga0.7As barriers. Both free heavy and light hole exciton and neutral donor-bound exciton peaks are observed in luminescence; excitation and temperature dependence is studied over the ranges 0.28 mW/cm2–10 W/cm2 and 1.7–30 K, respectively. The bound exciton luminescence saturates with respect to that of free excitons at high excitation, and rapid dissociation into free excitons is observed as the temperature increases. The free exciton peaks broaden at high temperature, while the bound exciton peaks remain sharp.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 2769-2771 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Device quality GaAs was grown in a conventional organometallic chemical vapor deposition reactor, using sequential group III (trimethylgallium, TMG) and group V (arsine) reactant gas exposures typical of atomic layer epitaxy (ALE). The results show that, at a given temperature, impurity (e.g., carbon) incorporation is controlled by the effective V/III ratio at the growing surface, which is determined by the sequence used in the growth cycles. This effect, specific to ALE, is quantified by solving the diffusion equation that describes concentration transients at the growing surface. Detailed photoluminescence experiments identified C and Mg as the residual acceptors and Ge as the sole residual donor in a 3×1015 cm−3 n-type background layer with mobilities of 5600 cm2/V s at room temperature and 35 000 cm2/V s at 77 K. A higher purity sample showed reduced levels of Ge, with traces of S, Si, and Te donors and only C acceptors.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1051-1053 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Recent studies have shown that Zn diffusion preferentially induces mixing (interdiffusion) of In and Ga in unstrained InGaAs/InP superlattices, with little diffusion of the anions. In the present study, a 3.1% lattice mismatch is accommodated in the mixed superlattice with no observable defects in layers on the order of the predicted critical layer thickness. At high concentrations, Zn resides preferentially in the InP layers in the form of Zn3P2. In marked contrast to this behavior of Zn, Si diffusion is observed to cause comparable interdiffusion on the cation and anion sublattices within a narrow range of dopant concentration. This result is at odds with some recent mixing models and is consistent with a divacancy mixing mechanism.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 2022-2024 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The passivating effects of spin-coated films of Na2S⋅9H2O on GaAs surfaces have been studied using room-temperature photoluminescence (PL) and low-temperature PL spectroscopy. After passivation, the 300 K PL efficiency is increased on both n- and p-type material; improvements of up to 2800× are observed. The surface field and surface recombination-related notch features in the free and bound exciton emission spectra at low temperature are eliminated, implying that the residual band bending under illumination is less than 0.15 V.
    Type of Medium: Electronic Resource
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