ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
Multilayer mirrors have been designed, fabricated and tested for use as a wavelength-selective filter of ∼100 eV for photo-CVD experiments at the beamline 12C of Photon Factory, KEK. Mo/Si and Rh/Si multilayers were selected in accordance with new simple optical criteria and fabricated on super-polished CVD-SiC substrates by means of ion-beam sputtering. Both mirrors showed a reflectance of over 40% at around the designed angle of incidence of 45°.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1140862
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