Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
66 (1989), S. 3126-3130
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A self-consistent calculation of the electron density and conduction-band edge is presented. The time-independent Schrödinger and Poisson equations are solved simultaneously under a high applied bias for structures with thick, lightly doped spacer layers. It is shown that strongly localized states occur in the well and accumulation regions. These states are capable of trapping a substantial amount of charge, which in turn can drastically change the shape of the band edge, and therefore need to be included in studies of the resonant tunneling problem in which the Coulomb interaction must be accounted for.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.344147
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