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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 39 (1986), S. 21-30 
    ISSN: 1432-0630
    Keywords: 78.55.-m ; 78.50.-w ; 68.55.+b
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Low-temperature photoluminescence of GaAs has been investigated in MBE-grown Al x Ga1−x As-GaAs single heterojunctions subject to an electric field. No peak energy shift is observed in the emission lines due to free excitons and excitons bound to isolated centers when the electric field is applied. In contrast, the excitonic lines arising from the previously described defect-induced bound exciton (DIBX) transitions exhibit a prominent low-energy shift when the electric field is increased. We attribute these lines to excitons bound to acceptor pairs. The excitons bound to distant pairs have smaller binding energies than those bound to closer pairs. They are, therefore, easily dissociated in a weak electric field. The electrons and holes thus dissociated may again be trapped by closer pairs, which results in a low-energy shift of the overall spectrum. The photocurrent measured as a function of the electric field supports Dingle's rule for the valence bandedge discontinuity.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physica B: Physics of Condensed Matter 175 (1991), S. 247-252 
    ISSN: 0921-4526
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Progress in Crystal Growth and Characterization of Materials 23 (1992), S. 73-126 
    ISSN: 0960-8974
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Geosciences , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physica B+C 129 (1985), S. 483-487 
    ISSN: 0378-4363
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Physica B+C 134 (1985), S. 412-416 
    ISSN: 0378-4363
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 4332-4339 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This article investigates the structure of an Er luminescence center in GaAs by using its intra-4f-shell luminescence spectrum as an atomic probe to identify the atomic configuration. This Er center is formed in GaAs by metalorganic chemical vapor deposition with O codoping and the center shows a high efficiency and a sharp luminescence spectrum under above-band-gap photoexcitation. A single luminescence line in the spectrum of a GaAs:Er,O splits into more than eight lines in the spectrum of Al0.01Ga0.99As:Er,O. This drastic change due to the addition of 1% Al can be explained by assuming that, because of the high tendency of Al atoms to react with O atoms, the Al atoms preferentially occupy the nearest-neighbor Ga sites of two O atoms, both of which are coupled with the Er atom. Based on the luminescence spectra and additional experiments of Rutherford backscattering and secondary ion mass spectroscopy, we propose that the structure of the Er luminescence center under study is Er occupying the Ga sublattice with two O atoms most likely located at the nearest-neighbor As sites. An Er-related spectrum of GaAs0.97P0.03:Er,O can also be understood based on this model if the chemical difference of Al and P is taken into account.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 3633-3640 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electron transport was studied in AlGaAs/GaAs wires fabricated using focused Ga-ion-beam implantation. Single-wire samples 0.2–10 μm wide and 20 μm long were prepared with various ion doses ranging 2×1011–4×1012 cm−2; multiple-wire samples 0.1–0.3 μm wide and 10 μm long were prepared with an ion dose of 2×1011 cm−2. Electron mobility is reduced in the narrow wires because of the implantation-induced damage, and this mobility degradation is diminished by reducing the ion dose. These behaviors are consistently explained in terms of a diffusive scattering effect inside the channel and at the sidewall of the channel. Mobility in wires with the 2×1011 cm−2 ions is predominantly determined by the sidewall specularity. A 0.2-μm-wide wire with this ion dose exhibits a mobility of 2×105 cm2/(V s) and a specularity above 0.8. These values exceed those previously reported for wires fabricated using ion implantation and probably arise from the annealing employed in the present work. Conductance steps are observed with a single 0.2-μm-wide wire, and enhanced transconductance steps occur in multiple-wire samples. These behaviors are related to mobility modulation that occurs when one-dimensional subbands cross the Fermi level.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 644-647 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence spectra were measured with molecular-beam epitaxy grown layers containing five different single quantum wells in an electric field. The photoluminescence intensity changed with the applied bias voltage in various ways according to the well width. An anti-Stokes shift in the peak energy was observed with the 2- and 3-nm quantum wells, while normal quantum confined Stark shifts were observed in the quantum wells with larger widths. These results were qualitatively interpreted in terms of the recombination rates both at the hetero-interfaces and in the quantum wells. Experimental results suggest that the impurity concentration at an interface between AlGaAs and an overlying GaAs layer is higher than that at an interface between GaAs and an overlying AlGaAs layer.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3948-3950 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The desorption rate of In atoms from an InAs surface and its dependence on surface As coverage is reported. InAs films were grown by molecular beam epitaxy on fully strained 1 monolayer thick In0.75Ga0.25As films deposited on (001) InAs substrates. Using a sensitive technique based on reflection high-energy electron diffraction, the desorption rate for In is found to be highly dependent on the As coverage. During a sublimation process, where In from an InAs surface is desorbed, the desorption rate at 510 °C is five times greater for a group III stabilized surface than for an As-stabilized surface. The difference in desorption rate is believed to be related to changes in the In to surface bond strengths. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 154-156 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: (GaAs)1−x(Si2)x/GaAs strained-layer superlattices (SLS) have been used as buffer layers to reduce the dislocation density in GaAs grown on Si by migration enhanced epitaxy (MEE). Double-crystal x-ray diffractograms of GaAs on Si grown using MEE with 3 packets of 5 period (GaAs)1−x(Si2)x/GaAs SLS buffer layers, exhibited a GaAs (004) peak full width at half maximum value of 150 arcsecs. The cross-sectional transmission electron microscopy investigations revealed extensive threading dislocation bending at each interface of (GaAs)1−x(Si2)x and GaAs, making the SLS highly efficient. The observed highly effective dislocation bending, we believe is due to a combined effect of built-in strain in the SLS and the relatively high elastic stiffness constant of (GaAs)1−x(Si2)x alloys. Plan-view transmission electron microscopy studies indicated dislocation densities 〈5×105 cm−2 at a distance of 0.2 μm from the surface of GaAs on Si.
    Type of Medium: Electronic Resource
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