Library

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    ISSN: 1432-0630
    Keywords: 61.14.Hg
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract There is a diffraction-induced phase effect in the RHEED intensity oscillation technique used in MBE, whereby intensity maxima only correspond to monolayer completion for very restricted conditions. In particular, the angle of incidence of the primary beam is extremely critical. The effect occurs because the total intensity at the measured position of the specular beam is always derived from at least two different diffraction processes, which do not have the same phase relation to monolayer formation. It can be accomodated either by a systematic series of measurements to establish an empirical relationship between incidence angle and phase, or by Fourier transform techniques. Unless full account is taken of this purely diffraction-induced effect, very misleading results can be obtained for the time constants of the recovery period following cessation of growth and this is illustrated for GaAs. The effect also has important implications for the growth-interrupt technique. In addition, it is shown that for heterojunction formation in the GaAs/(Al, Ga)As system, adatom (Ga and Al) migration lengths are of greater importance than the position in the monolayer at which the composition is changed, and that RHEED can provide only limited information on the interface structure.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 2333-2337 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The transition from growth by the formation and coalescence of two-dimensional clusters to the growth by step advancement on vicinal InAs(001) surfaces has been examined during molecular-beam epitaxy by the measurements of reflection high-energy electron diffraction oscillations. The growth mode transition is compared with results from vicinal GaAs(001) surfaces and qualitatively analyzed on the basis of the surface migration and attachment kinetics of In adatoms.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 8066-8070 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: (InAs)1(GaAs)2 superlattice structures have been grown on GaAs(001) using molecular beam epitaxy and the photoluminescence experiments performed on them demonstrate that it is possible to modify the band gap of the binary InAs/GaAs system from 0.85 to 1.07 μm at 13 K. Most importantly, by annealing the sample in a hydrogen plasma, impurities as well as nonradiative centers are passivated, allowing intrinsic luminescence to be observed up to 1.14 μm at room temperature. X-ray diffraction measurements also performed show that the as-grown samples are indeed superlattices consisting of InAs and GaAs layers of thickness 1 and 2 monolayers, respectively.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 6454-6457 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The strain relaxation of In0.1Ga0.9As layers on GaAs (110) was studied by transmission electron microscopy (TEM) and x-ray diffraction. TEM observation showed that strain relief in the (110) interface is initially dominated in the [001] direction by the formation of 60° type dislocations and stacking faults via {111}〈011〉 slip systems for layer thicknesses up to approximately 200 nm. As the layer thickness increases, {113}〈011〉 slip systems became active and the resultant misfit dislocations contribute strain relief in both [001] and [11¯0] directions. The efficiency of strain relief by the different misfit dislocations is discussed. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 2481-2485 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence (PL), secondary-ion mass spectroscopy (SIMS), and cross-sectional transmission electron microscopy (TEM) measurements have been performed to assess surface segregation of In in GaAs during molecular-beam epitaxial growth of InAs monolayers between GaAs layers. The InAs growth temperature at which In segregation is detectable depends on the characterization technique used; using PL it is above 420 °C, but from TEM and SIMS it is 420 and 340 °C, respectively. These results highlight the need for complementary information to provide a better understanding of the segregation phenomenon. SIMS data show that the total amount of In segregating and the extent of its distribution both increase with InAs deposition temperature.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 3415-3417 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A computer simulation developed for modeling the growth of low-dimensional III-V alloy structures by molecular-beam epitaxy (MBE) is used to assess the potential of MBE as a method for growing high-quality quantum-well wires. The existence of a temperature window for optimum growth quality is demonstrated, with the position and width of the window showing a sensitivity to the beam flux.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 7
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report here on the reflection high-energy electron diffraction, photoluminescence (PL), and photoluminescence excitation study of the direct growth by molecular-beam epitaxy of one and two monolayers (MLs) of InAs on GaAs. InAs can be grown pseudomorphically up to a thickness of 1 ML, deposition of 2 MLs results in three-dimensional nucleation. In the latter case our results suggest that the first ML is disrupted by the growth of the second. This finding is in contradiction of the Stranski–Krastanov growth mode. A 1-ML InAs quantum well (QW) with GaAs barriers produces intense luminescence at 1.465 eV, whereas for the intended 2-ML InAs QW sample, PL characteristic of InAs clusters with a most probable thickness of 3 MLs is observed.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5168-5172 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Reflection high-energy electron diffraction was used to monitor Si(111) growth during gas source molecular beam epitaxy using disilane (Si2H6). Depending on the substrate temperature, the growing Si(111) surface was found to exhibit hydrogenated δ(7×7), (1×1), (5×5), and (7×7) reconstructions. Within the substrate temperature range of 490 to 560 °C where growth proceeded two-dimensionally, clear and well-defined intensity oscillations could be observed in the [21¯0] azimuths. Since consecutive atomic layers on the Si(111) surface are nonequivalent, the oscillation periods were found to correspond to bilayer growth. In the two-dimensional (2D) growth regime, the oscillation frequencies, and hence the growth rates deduced, were found to increase with increasing substrate temperature and flow rate of Si2H6. At higher temperatures, there was a change from 2D layer-by-layer growth to step propagation and consequently, the intensity oscillations were weak or absent. At low temperatures (〈400 °C) where no dissociative adsorption of Si2H6 occurred, intensity oscillations were not observed.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 4299-4304 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have systematically examined the transition from two-dimensional nucleation to step-flow growth on variously misoriented vicinal GaAs (001) surfaces during molecular beam epitaxy using reflection high-energy electron diffraction (RHEED). The time to the first maximum of the RHEED intensity oscillations is gradually delayed as the growth mode transition temperature is approached from below as the result of an increasing number of adatoms being incorporated at steps. Detailed analysis of this delay has shown that the incorporation rate is independent of the Ga flux, but it is strongly dependent on the direction of misorientation. This means that step edges do not act as perfect sinks for adatoms, but that detachment can occur relatively easily. The energy barrier for incorporation is considerably higher for Ga- than As-terminated steps, which strongly suggests that the anisotropic growth mode transition on GaAs (001) stems mainly from the different step structures rather than anisotropic Ga adatom migration.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 845-849 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied the effects of inserting Si/Si0.6Ge0.4 strain-balanced superlattices (SLs) into Si0.8Ge0.2 (001) virtual substrates. The SiGe SL layer thickness chosen was larger than the critical thickness for elastic relaxation and generated numerous hemicylindrical features oriented along the 〈100〉 directions. These features lead, when covered by Si0.8Ge0.2, to a disruption of the well-ordered surface crosshatch along the 〈110〉 directions, and to a significant lowering of the surface roughness. There is also evidence for some filtering of the threading dislocations by the SL. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...