ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The effect of incomplete ionization of dopants on the capacitance–voltage (C–V) characteristics in 6H–SiC metal-oxide-semiconductor (MOS) capacitors has been investigated. The present exploration is based on the one-dimensional numerical solving of Poisson's equation using the finite-difference method with a nonuniform mesh size. The results obtained from this approach are in good agreement with the first analytical results reported by Bouillon and Skotnicki in the case of indium impurities in silicon [IEEE Electron Device Lett. 19, 19 (1996)]. For p-type 6H–SiC material, characterized by deeper doping impurity energies (principally aluminum and boron), simulations predict the occurrence of a "kink effect" on the C–V curves, depending on temperature and doping level, that could lead to experimental errors in the extraction of MOS device parameters, including effective doping level, interface trap density, and fixed oxide charge. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.371061
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