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Notes: Using an expanding cascaded arc plasma jet, amorphous hydrogenated and fluorohydrogenated carbon films were deposited on silicon, glass, and steel substrates at high rates of tens of nanometers per second and on large areas of up to 100 cm2. The present work was aimed at depositing amorphous carbon films suited for optical and protective applications. Films deposited with the common argon/methane or argon/acetylene mixture tend to delaminate from the substrate when the film is thicker than about 1 μm. For this reason, also trials using other compounds like C7H8 (toluene), CF4, and H2, and mixtures of these, were carried out. Using toluene, several-μm-thick films with good adhesion to the substrate were deposited. With spectroscopic ellipsometry and infrared absorption spectroscopy optical parameters were obtained. Appropriate numerical models were developed for analyzing the data, taking into account interference fringes in the spectra due to multiple reflections in the thin film. The hydrogen and oxygen content in the films were determined with nuclear recoil techniques. Films deposited with the use of methane and acetylene are diamondlike with mainly sp3 bonding types, and a hydrogen content ranging from 36 to 26 at. % (with a low oxygen contamination of 1–2 at. %). Films deposited with the use of toluene are more polymerlike, with also sp1 and sp2 bonding types. These films have a high hydrogen content (35 at. %), and can be partially oxidized (up to 13 at. %).In general, going from the polymerlike to the more diamondlike films, the refractive index increases from 1.3 to 2.2, and the band gap decreases from about 2 to 1 eV. By the admixture of hydrogen in the deposition plasma diamondlike films were produced with a larger band gap of 2.2 eV. The corrosion performance of the films was studied by storing them in a humidity cabinet. The corrosion resistance of films deposited with hydrocarbon/argon plasma mixtures appears to be limited. Thick films with a good corrosion resistance were produced by admixing a fluorine containing gas in the plasma. Analysis of the infrared absorption spectra showed that these films consist of amorphous fluorohydrogenated carbon. The presence of fluorine radicals in the plasma may lead to a chemically enhanced surface mobility, leading to a less porous film structure, and resulting in lower internal stresses. The growth rates and the corrosion performances of the films appear to be different for substrates of different types of steel. This may be attributed to different initial growth mechanisms, as a consequence of the difference in electrical and thermal conductivity of the two substrate types used here. © 1995 American Institute of Physics.

Notes: The plasma chemistry of an argon/hydrogen expanding thermal arc plasma in interaction with silane injected downstream is analyzed using mass spectrometry. The dissociation mechanism and the consumption of silane are related to the ion and atomic hydrogen fluence emanating from the arc source. It is argued that as a function of hydrogen admixture in the arc, which has a profound decreasing effect on the ion-electron fluence emanating from the arc source, the dissociation mechanism of silane shifts from ion-electron induced dissociation towards atomic hydrogen induced dissociation. The latter case, the hydrogen abstraction of silane, leads to a dominance of the silyl (SiH3) radical whereas the ion-electron induced dissociation mechanism leads to SiHx (x〈3) radicals. In the pure argon case, the consumption of silane is high and approximately two silane molecules are consumed per argon ion-electron pair. It is shown that this is caused by consecutive reactions of radicals SiHx(x〈3) with silane. Almost independent of the plasma conditions used, approximately one H2 is produced per consumedSiH4 molecule. Disilane production is observed which roughly scales with the remaining silane density. Possible production mechanisms for both observations are discussed. © 1998 American Institute of Physics.

Notes: Optical absorption spectroscopy has been applied to measure the absolute population densities of the first excited levels of atomic hydrogen H*(n=2) and argon Ar*(4s) in an expanding cascaded arc plasma in hydrogen-argon mixture. It is demonstrated that the method allows us to determine both H*(n=2) and Ar*(4s) absolute density radial profiles for H2 admixtures in Ar ranging from 0.7% to 10% with good accuracy. The measured H*(n=2) densities are in the 1014–1016 m−3 range, and Ar*(4s) densities are in the range of 1015–1018 m−3. It has been shown, that the density of hydrogen excited atoms H*(n=2) serves as an indicator of the presence of argon ions and hydrogen molecules in the expanding plasma. A kinetic model is used to understand evolution of H*(n=2) density in the expansion, and to estimate the total atomic hydrogen population density and hydrogen dissociation degree in sub- and supersonic regions of the plasma.

Notes: Fabry–Pérot line profile measurements have been used to obtain heavy particle temperatures and electron densities for an expanding cascaded arc plasma in argon. This was done for the argon 415.9 and 696.5 nm neutral lines as a function of the distance from the onset of the expansion. Temperatures in the range of 2000–12 000 K were obtained. The electron density in the beginning of the expansion appeared to be 5.6×1021 m−3. The 696.5 nm line profiles appeared to be asymmetric because of self-absorption by cool metastables around the plasma. The density and temperature of these metastables could be determined by fitting the measurements to a theoretical model, and appeared to be around 1017 m−3 and around 3000 K, respectively.

Notes: Results from emission spectroscopy measurements on an Ar/SiH4 plasma jet which is used for fast deposition of amorphous hydrogenated silicon are presented. The jet is produced by allowing a thermal cascaded arc plasma in argon (I=60 A, V=80 V, Ar flow=60 scc/s and pressure 4 × 104 Pa) to expand to a low pressure (100 Pa) background. In the resulting plasma SiH4 is injected in front of the stationary shock front. Assuming a partial local thermal equilibrium situation for higher excited atomic levels, emission spectroscopy methods yield electron densities (∼ 1018 m−3), electron temperatures (∼5000 K) as well as concentrations of H+, Si+, and Ar+ particles. The emission spectrum of the SiH radical, the A 2Δ–X 2Π electronic transition, is observed. Numerical simulations of this spectrum are performed, resulting in upper limits for the rotational and vibrational temperatures of 4000 and 5600 K, respectively. The results can be understood assuming that, in the expansion, charge exchange and dissociative recombination are dominant processes in the formation of species in excited states, notably Si+.

Notes: An expanding thermal arc plasma in argon–hydrogen is investigated by means of emission spectroscopy. The hydrogen can be added to the argon flow before it enters the thermal arc plasma source, or it can be flushed directly into the vacuum expansion vessel (1–20 vol % H2). The atomic state distribution function for hydrogen, measured at a downstream distance of 20 mm, turns out to be very different in the two cases. For injection in the arc, three-particle recombination is a primary source of hydrogen excitation, whereas measurements with hydrogen injected into the vessel clearly point to a molecular channel (dissociative recombination of formed ArH+) populating atomic hydrogen levels. © 1995 American Institute of Physics.

Notes: The expanding plasma obtained from a cascaded arc thermal source is analyzed with double probe, mass spectrometric, and Faraday cup measurements. In the argon–nitrogen mixtures a decrease in ion fluence is observed, contrary to pure argon plasmas in which recombination is insignificant. The recombination in argon–nitrogen plasmas is caused by charge exchange between atomic ions and N2 molecules followed by dissociative recombination. Hence, these processes account for the enhanced axial decay of the plasma density and also for the change in the ion mass spectra of the ion beam extracted from the expanding plasma. The total ion beam current density is also governed by charge exchange followed by dissociative recombination and is thus dependent on the recirculating neutral molecules.

Notes: The plasma density in an expanding thermal plasma was determined using planar Langmuir probe measurements. The arc plasma was operated at low flow (500 standard cm3 per minute). It is shown that the decrease of density with increasing distance from the nozzle of the arc in an argon plasma can be explained by diffusion away from the expansion axis. The determined decay length is 10 cm. In the case that nitrogen is injected in the arc, the plasma density is lowered considerably due to charge exchange and dissociative recombination in the expansion. Because of the low electron density (1017 m−3) at a partial nitrogen flow larger than 10%, the dissociative recombination becomes slow. The main loss process of N2+ ions in this case is diffusion away from the plasma axis. The effective decay length found in the nitrogen plasma is 9 cm. © 1997 American Institute of Physics.

Notes: This paper deals with the specifications and the possibilities of a novel highly sensitive optical absorption spectroscopy method. It consists of a cascaded arc as an extremely bright broadband light source with a high resolution spectrometer as a detector. Its interest for a continuous quantitative monitoring of the densities of waste atoms and molecules in the atmosphere is investigated. To this end, theoretical considerations are given with respect to the detection limits and the resolution necessary for selective spectrochemical analysis. In the first measurements with the setup, on a laboratory argon-hydrogen plasma, the versatility and sensitivity of the technique for measuring low species densities is demonstrated. Densities of the sublevels of the argon first excited state, the four Ar(3p54s) metastable and resonant substates, were measured simultaneously in one measuring sequence. The data were analyzed using an efficient line of sight integration technique. The densities of these substates are of the order of 1017 m−3 in a plasma with a pressure of 40 Pa. For the atomic hydrogen H(n=2) state, densities of the order of 1014 m−3 over a length of about 2 cm could be measured, representing a detection limit of approximately 2×1012 m−2. © 1995 American Institute of Physics.

Notes: A combined Thomson–Rayleigh scattering device is discussed. It consists of a Nd:YAG laser as a light source in combination with a multichannel detection technique consisting of a gated light amplifier in combination with an optical multichannel analyzer. Special attention is focused on the analysis of the measured spectra. Including convolution methods and taking into account weak coherent effects increases the dynamic range and the accuracy of the measured electron density ne and temperature Te and neutral particle density n0. Accuracies of 1%–4% for ne, 2%–6% for Te, and 10%–50% for n0 depending on the plasma condition are obtained. The dynamic range for ne is 7×1017–1021 m−3, for n0 is 1020–1023 m−3 and for Te is 1000–50 000 K.