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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 5815-5875 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present a comprehensive, up-to-date compilation of band parameters for the technologically important III–V zinc blende and wurtzite compound semiconductors: GaAs, GaSb, GaP, GaN, AlAs, AlSb, AlP, AlN, InAs, InSb, InP, and InN, along with their ternary and quaternary alloys. Based on a review of the existing literature, complete and consistent parameter sets are given for all materials. Emphasizing the quantities required for band structure calculations, we tabulate the direct and indirect energy gaps, spin-orbit, and crystal-field splittings, alloy bowing parameters, effective masses for electrons, heavy, light, and split-off holes, Luttinger parameters, interband momentum matrix elements, and deformation potentials, including temperature and alloy-composition dependences where available. Heterostructure band offsets are also given, on an absolute scale that allows any material to be aligned relative to any other. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 4734-4739 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spin-polarized intersubband lasers based on optically pumped type-II antimonide quantum wells in a magnetic field are proposed. Complete discretization of the electron energy spectrum is predicted to extend the electron lifetime considerably. Continuous-wave room-temperature operation is projected for both interband and intersubband pumping configurations lasing at λ=16–24 μm. Furthermore, the parasitic capacitances associated with electrical injection are eliminated, and the large differential gain and fast intrinsic time scale should give modulation bandwidths in excess of 100 GHz. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Physics of Plasmas 3 (1996), S. 2197-2202 
    ISSN: 1089-7674
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Etching of SiO2 with CF4 in three types of high density–low pressure (5×1011 cm−3, 1–10 mTorr) etch tools: electron cyclotron resonance (ECR), inductively coupled (ICP), and helicon (HRF) is described. Although the physical processes that produce the plasma in the three types of sources are quite different, the etch rate processes are identical when viewed from the wafer sheath boundary. Measurements demonstrate that if sufficient fluorine is present, the etch rate limiting step depends only on the ion energy flux to the wafer, rather than on the details of the chemical species. Etch rate control depends only on the wafer bias power. Experimental results are device independent so the etch rate in high density–low pressure plasma sources does not depend on the plasma source power. Major differences in tool etch rate characteristics are more likely determined by tool wall material (and wall chemistry) and tool geometry rather than the physical process that is used to produce the plasma. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1365-2389
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Geosciences , Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: Throughout the world there is a trend towards retaining crop residues rather than burning them. For this reason, changes in soil chemistry and aggregation in a Vertisol induced by 59 years of burning or green cane harvesting with or without annual fertilizer applications were investigated. Crop residues were either burnt prior to harvest with the harvest residues raked off (R1), burnt prior to harvest with the harvest residues left on the soil surface (R2), or left unburnt with all the trash left on the soil surface (R3). Concentrations of organic C in the surface 10 cm of soil increased with fertilizer applications and with increasing amounts of crop residue returned in the order R1 〈 R2 〈 R3. Fertilizer applications caused an accumulation of residual P in both inorganic (Pi) and organic (Po) forms. A sequential P fractionation showed that fertilizer P accumulated in both labile and recalcitrant Pi and Po forms, and trash retention caused an accumulation of recalcitrant Po. Concentrations of K decreased in the unfertilized R1 and R2 treatments because K reserves were depleted. By contrast, there was an increase in the concentrations of K in the fertilized R3 treatment. The soil became more acid on the fertilized and, to a lesser extent, trash retention plots. We attribute this to nitrification and subsequent nitrate leaching. Acidification resulted in a loss of exchangeable Ca and Mg, a decrease in ECEC, and an increase in the concentrations of total and monomeric Al in soil solution, in exchangeable Al3+ and in the buffering reserve of non-exchangeable Al associated with organic matter. Aggregate stability was increased by increasing crop residues but decreased by fertilizer applications. The decrease was attributed to an increase in the proportion of exchangeable cations present in monovalent form due to applications of fertilizer K and leaching of Ca and Mg. We conclude that trash retention and annual fertilizer applications have substantial long-term effects on both organic matter status and soil pH and therefore on other soil chemical and physical properties.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1298-1302 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electromagnetic fields in a planar rf inductively coupled plasma source, of interest for materials processing, were measured using a two-loop inductive (B-dot) probe. The two loops were oriented to measure the time derivative of the axial and radial components of the magnetic field B(overdot)z and B(overdot)r, respectively, at various positions in the r–z plane of the cylindrically symmetric argon discharge. Maxwell's equations were used with this data to calculate amplitudes of the rf azimuthal electric field Eφ and current density Jφ, as well as the complex permittivity ε of the plasma, from which the electron density ne was calculated. The electron densities calculated using this technique were found to compare favorably to the results of measurements made with Langmuir probes. Electron drift velocities calculated from Jφ and ne were found to be comparable to electron thermal velocities in the region of highest Eφ and thus may contribute to local enhancement of electron impact reactions, thereby affecting process chemistry and uniformity. The peak in the drift velocity moved radially outward as the pressure increased due changes in the radial plasma density profile. This technique is applicable to chemistries where Langmuir probes are not practical. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 7662-7665 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We propose an all-optical limiter based on the thermally induced intervalley transfer of electrons from Γ-valley states with forbidden normal-incidence intersubband interactions to L-valley states which absorb strongly. Detailed modeling of the device performance in the short-pulse regime (≤100 ns) yields that the output intensity for a limiter with only 10% insertion loss at low excitation levels will remain clamped over a dynamic range of 25–40.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 90-96 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electromagnetic fields in a planar radio-frequency inductively coupled plasma source were measured using an inductive loop (B-dot) probe. The probe was oriented to measure the time derivative of the axial component of the magnetic field (B(overdot)z). Using these measurements and Faraday's law, taking advantage of cylindrical symmetry, the time varying azimuthal electric field (Eφ) was calculated directly. Contour plots of B(overdot)z and Eφ in the r-z plane show that the radio-frequency electromagnetic fields penetrate further into the plasma at lower gas pressure and lower rf power, corresponding to less effective shielding of the fields at lower plasma density. Estimates of skin depth from the axial decay of the field amplitudes near the axis of the discharge are consistent with values calculated from plasma parameters measured with Langmuir probes, confirming that near the axis the degree of shielding is most strongly dependent on the local plasma density. Near the conducting walls of the chamber, the skin depth calculations from the Langmuir probe data diverge from the B-dot probe data. B-dot probe measurements taken in the absence of plasma show that near the walls of the chamber the axial decay of the field amplitude is partly a geometrical effect in addition to a plasma shielding effect. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Two different approaches, a photoconductive response technique and a correlation of lasing thresholds with theoretical threshold carrier concentrations have been used to determine Auger lifetimes in InAs/GaInSb quantum wells. For energy gaps corresponding to 3.1–4.8 μm, the room-temperature Auger coefficients for seven different samples are found to be nearly an order-of-magnitude lower than typical type-I results for the same wavelength. The data imply that at this temperature, the Auger rate is relatively insensitive to details of the band structure. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 3607-3609 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A 2.9 μm diode laser with InAs/GaSb/Ga0.75In0.25Sb/GaSb superlattice active region displays a maximum operating temperature of 260 K. At 200 K, the threshold current density is 1.1 kA/cm2 and the quantum efficiency is 〉15%. The peak output power per facet exceeds 800 mW at 100 K and 200 mW at 200 K for a 0.05% duty cycle. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 3483-3485 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report a type-II antimonide midinfrared vertical-cavity surface-emitting laser. The emission wavelength of 2.9 μm is nearly independent of temperature (dλ/dT(approximate)0.07 nm/K) and the multimode linewidth is quite narrow (3.5 nm). The pulsed threshold power at 86 K is as low as 22 mW for a 30 μm spot. Lasing is observed up to T=280 K, and the peak output power from a 600 μm spot exceeds 2 W up to 260 K. The differential power conversion efficiency is 〉1% at 220 K. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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