Bibliothek

feed icon rss

Ihre E-Mail wurde erfolgreich gesendet. Bitte prüfen Sie Ihren Maileingang.

Leider ist ein Fehler beim E-Mail-Versand aufgetreten. Bitte versuchen Sie es erneut.

Vorgang fortführen?

Exportieren
Filter
  • 1995-1999  (11)
Materialart
Erscheinungszeitraum
Jahr
  • 1
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4112-4115 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: High quality epitaxial layers of Al0.22Ga0.78As have been grown on Si substrates by adopting thermal cycle annealing. The quality of the Al0.22Ga0.78As has been assessed by photoluminescence, deep-level transient spectroscopy, and double-crystal x-ray diffraction studies. The emergence of a new luminescence emission (1.718 eV), high concentrations of shallow levels, passivation of a deep level (0.43 eV), and dislocation reduction in the high-temperature thermal cycle annealed samples have been explained by a silicon diffusion mechanism and the formation of complex point defects. Deep-level emission at 0.64 eV has been attributed to disordering in the epitaxial layers. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 2
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3836-3838 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: A vertical-cavity surface-emitting laser diode with 20 pairs of AlAs/GaAs distributed Bragg reflectors (DBRs) has been grown on a Si substrate using metalorganic chemical vapor deposition. Interfacial roughness and compositional profile of the AlAs/GaAs DBR structure were studied by cross-sectional scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Auger electron spectroscopy. Cross-sectional SEM and TEM observations reveal quasi-periodic zigzag roughness and nonuniformity in the AlAs and GaAs layers. Auger electron spectroscopy reveals compositional transitions at the AlAs/GaAs heterointerfaces. A lower reflectivity of the AlAs/GaAs DBR on the Si substrate is caused by the degraded heterointerfaces. © 1995 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 3
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 9375-9378 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The effects of a thermal cycle annealing (TCA) process on the defects in GaAs and AlxGa1−xAs solar cells on Si substrates are described in this paper. The defect density is reduced and the solar cell efficiency is improved by TCA. The defect density and the solar cell efficiency are evaluated in detail with respect to TCA temperature and Al composition. The problems involved in the fabrication of a high efficiency AlGaAs solar cell on a Si substrate are discussed. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 4
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 4196-4199 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The improvements of the AlGaAs solar cell grown on the Si substrate and the AlGaAs/Si tandem solar cell by metalorganic chemical vapor deposition have been investigated. The active-area conversion efficiency of the Al0.1Ga0.9As solar cell on the Si substrate as high as 12.9% has been obtained by improving the growth sequence and adopting an Al compositionally graded band emitter layer. A high efficiency monolithic AlGaAs/Si tandem solar cell with the active-area conversion efficiency of 19.9% and 20.6% (AM0 and 1 sun at 27 °C) under two-terminal and four-terminal configurations, respectively, is demonstrated. © 1995 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 5
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 5816-5821 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We report characteristics and degradation of an InGaN/AlGaN double-heterostructure light-emitting diode (LED) grown by metalorganic chemical vapor deposition on a sapphire substrate. The InGaN/AlGaN LED exhibited an optical output power of 0.17 mW, an external quantum efficiency of 0.2%, a peak emission wavelength at 440 nm with a full width at half-maximum of 63 nm, and a stable operation up to 3000 h under 30 mA dc operation at 30 °C. However, the InGaN/AlGaN LED showed electrical and optical degradations under high injected current density and high ambient temperature. Electroluminescence, electron-beam-induced current and cathodoluminescence observations showed that the degraded InGaN/AlGaN LED exhibited formation and propagation of dark regions, which act as nonradiative recombination centers. The values of the degradation rate were determined to be 1.1×10−3, 1.9×10−3, and 3.9×10−3 h−1 under the injected current density of 100 A/cm2, and 1.6×10−2, 3.6×10−2, and 8×10−2 h−1 under 200 A/cm2 at ambient temperatures of 30, 50, and 80 °C, respectively. The activation energy of degradation was also determined to be 0.23–0.25 eV. The degradation of electrical and optical characteristics was caused by the growth of dark regions. It was also observed that GaN-based LEDs on sapphire substrates have longer lifetime than the ZnSe-based LED, but shorter than the AlGaAs and InGaAsP LEDs. © 1997 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 6
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3605-3607 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We have grown Al-free reliable 877 nm In0.49Ga0.51P/GaAs light-emitting diodes (LEDs) on Si substrates by metalorganic chemical vapor deposition. The conventional Al-containing Al0.3Ga0.7As/GaAs LEDs on Si substrates exhibit rapid degradations because of the formation of dark-line defects (DLDs). On the contrary, the In0.49Ga0.51P layer on the GaAs/Si substrate exhibited a 300 K electron mobility of 950 cm2/V s with the carrier concentration of 3.8×1017 cm−3, no residual stress and a lower surface recombination velocity. The In0.49Ga0.51P/GaAs LED on Si shows the stable operation for more than 2000 h, which results from the suppression of the formation of DLDs. © 1995 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 7
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 2995-2997 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We have studied the rapid degradation of the AlGaAs/GaAs single quantum well laser diodes on Si substrates grown by metalorganic chemical vapor deposition. The dislocations propagate at velocities up to ∼75 μm/h along 〈100〉 and ∼20 μm/h along 〈110〉, which cause an increase in threshold current and a decrease in differential quantum efficiency. The degraded current–voltage characteristic resulted from the defect-assisted impurity diffusion. The degradation process occurs very rapidly due to the presence of a high density of defects and thermally induced strain. © 1995 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 8
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 830-832 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We report an optical degradation of an InGaN/AlGaN double-heterostructure light-emitting diode (LED) on a sapphire substrate grown by metalorgonic chemical vapor deposition. Electroluminescence, electron-beam induced current, and cathodoluminescence observations have shown that the degraded InGaN/AlGaN LED exhibits formation and propagation of dark spots and a crescent-shaped dark patch, which act as nonradiative recombination centers. The values of degradation rate under injected current density of 0.1 kA/cm2 were determined to be 1.1×10−3, 1.9×10−3, and 3.9×10−3h−1 at ambient temperatures of 30, 50, and 80°C, respectively. The activation energy of degradation was also determined to be 0.23 eV. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 9
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 809-811 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The electrical properties of electron beam (EB) evaporated silicon dioxide (SiO2)/n-GaN, plasma enhanced chemical vapor deposited (PECVD) SiO2/n-GaN, and PECVD silicon nitride (Si3N4)/n-GaN interfaces were investigated using high frequency capacitance–voltage measurements. Compositions of the deposited insulating layers (SiO2 and Si3N4) were analyzed using x-ray photoelectron spectroscopy. Metal-insulator-semiconductor structures were fabricated on the metalorganic chemical vapor deposition grown n-type GaN layers using EB, PECVD grown SiO2 and PECVD grown Si3N4 layers. Minimum interface state density (2.5×1011 eV−1 cm−2) has been observed in the PECVD grown SiO2/n-GaN interface when it was compared with EB evaporated SiO2/n-GaN interface (5.3×1011 eV−1 cm−2) and PECVD Si3N4/n-GaN interface (6.5×1011 eV−1 cm−2). The interface state density (Nf) depends on the composition of deposited insulating layers. © 1998 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 10
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 523-525 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We report the preliminary results on self-formed GaAs islands grown on the GaAs/Si substrate by metalorganic chemical vapor deposition using droplet epitaxy. Atomic force microscope observation shows that the GaAs islands exhibit a conical shape with heights of 90–170 nm, diameters of 600–750 nm, and densities of 107 cm−2, which are controlled by the trimethylgallium flow rate. In addition, an AlGaAs/GaAs light-emitting diode (LED) on Si with a self-formed GaAs island active region was fabricated by the use of this technique. The LED was operated up to 27 μW at 190 mA under direct current conditions at room temperature. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
Schließen ⊗
Diese Webseite nutzt Cookies und das Analyse-Tool Matomo. Weitere Informationen finden Sie hier...