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  • 1995-1999  (4)
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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High-temperature-superconductor Josephson junctions with an edge geometry of superconductor/normal-metal/superconductor have been fabricated on yttria-stabilized zirconia substrates by engineering the electrode and N-layer material to reduce the lattice mismatches (a, b, and c). With GdBa2Cu3O7−δ as electrodes and Pr-doped Y0.6Pr0.4Ba2Cu3O7−δ as a barrier, the lattice mismatches from electrode and barrier layer are reduced to a very low level. The junctions fabricated with such a design demonstrate resistively shunted junction current-voltage characteristics under dc bias at temperatures in the range of 77–88 K. The quite low specific interface resistivity on the order of 10−10 Ω cm2 indicates that the junction performance is controlled by the normal-metal (N) layer material instead of the interfaces. The use of lattice-matched electrode and N-layer material is one of the key design rules to obtain controllable high-temperature superconductor Josephson junctions. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements of hydrogen loss and luminescence as a function of annealing temperature in porous silicon suggest that luminescence is attributable to electron-hole recombination in SiOx surface layers with an intensity that is dependent upon the surface hydrogen content. The luminescence is composed of three Gaussian bands similar to those found in amorphous SiO2. X-ray photoelectron spectroscopy and scanning electron microscopy show porous silicon has SiOx on the surface, which is comprised of many particles of about 10 nm size. Collectively, the data strongly support the previously proposed quantum confinement/luminescence center model. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 2197-2199 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial Ba0.5Sr0.5TiO3 (BST) thin films were deposited on LaAlO3 substrates with the conductive metallic oxide SrRuO3 (SRO) as a bottom electrode by pulsed laser deposition. The BST and SRO films were (h00) and (00l) oriented normal to the substrate surface, respectively. The epitaxial nature of both BST and SRO layers was determined by the measurement of in-plane orientation with respect to the major axes of the substrate. Ion beam channeling with a minimum yield of around 10% from Rutherford backscattering spectrometry demonstrated the films to be of high crystallinity. A dielectric constant around 500 and dielectric loss less than 0.01 at a frequency of 10 kHz were measured on the capacitors with a configuration of Ag/BST/SRO. Electrical measurements on such epitaxial BST films showed a breakdown voltage above 106 V/cm and a leakage current density of less than 5×10−8 A/cm at a field intensity of 2×105 V/cm. These results prove the BST/SRO heterostructure to be a good combination for microelectronic device applications. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 1677-1679 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Highly conductive ruthenium oxide (RuO2) has been epitaxially grown on LaAlO3 substrates by pulsed laser deposition. The RuO2 film is (h00) oriented normal to the substrate surface. The heteroepitaxial growth of RuO2 on LaAlO3 is demonstrated by the strong in-plane orientation of thin films with respect to the major axes of the substrate. High crystallinity of RuO2 thin films is also determined from Rutherford backscattering channeling measurements. Electrical measurements on the RuO2 thin films demonstrate a quite low room-temperature resistivity of 35±2 μΩ cm at deposition temperatures of above 500 °C. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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