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Characterization of processing-induced defects in high-purity InP by photoluminescence (1992)

Mayer, K. M. ; Makita, Y. ; Yamada, A. ; [weitere]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 72 (1992), S. 1080-1085

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ISSN: 1089-7550

Quelle: AIP Digital Archive

Thema: Physik

Notizen: Low-temperature photoluminescence experiments were performed on high-purity InP substrates as a function of heat treatment, flat-profile ion implantation and subsequent annealing procedures. Whereas the well resolved near band edge luminescence proved the superior substrate quality, up to 6 sharp luminescence lines (some of them not reported so far) and one shallow broad-band emission were observed after Si3N4 deposition and various annealing procedures. From the temperature dependence of the luminescence peak intensities the activation energies of the novel lines were determined and discussed in terms of excitons bound to processing-induced complex defects. These assignments are supported by the observation of a strong enhancement of the luminescence after low dose Ar+ ion implantation.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.351783

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Digitale Medien

Low residual impurities assessment by photoluminescence in multistep wafer-annealed semi-insulating Czochralski-grown GaAs (1992)

Ka, O. ; Oda, O. ; Makita, Y. ; [weitere]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 61 (1992), S. 1095-1097

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ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: Multistep wafer-annealed semi-insulating GaAs wafers (MWA) are characterized using photoluminescence (PL). The PL spectra present well-resolved near-band-edge transitions, including the doublet of the neutral acceptor-bound exciton. A detailed investigation using selective pair luminescence of samples submitted to different annealings, i.e., wafer- or ingot-annealing, single or multistep, shows that carbon is the main shallow acceptor. However, for the wafer-annealed samples, two other residual impurities found in the as-grown or ingot-annealed crystals have their estimated concentrations noticeably reduced, for Zn (e.g., around 1013 cm−3 in MWA), or are unresolved for Si. This reduction of background impurities may have direct consequences for device applications.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.107679

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